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Magnetic-Compression/Magnetized-Target Fusion (Mago/Mtf): A Marriage of Inertial and Magnetic Confinement

Description: Intermediate between magnetic confinement (MFE) and inertial confinement (ICF) in time and density scales is an area of research now known in the US as magnetized target fusion (MTF) and in Russian as MAGO (MAGnitnoye Obzhatiye--magnetic compression). MAGO/MTF uses a magnetic field and preheated, wall-confined plasma fusion fuel within an implodable fusion target. The magnetic field suppresses thermal conduction losses in the fuel during the target implosion and hydrodynamic compression heating… more
Date: December 31, 1996
Creator: Lindemuth, I. R.; Ekdahl, C. A. & Kirkpatrick, R. C.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
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Development of Imploding Liners With Kinetic Energies {Gt} 100 MJ and Their Applications

Description: The Los Alamos program in High Energy Density Physics is developing high performance imploding liners as sources of high energy density environments for experimental physics applications. High performance liners are, for these purposes, liners with high velocity, 100 MJ or more kinetic energy at 20-50 MJ/cm of height. They must have sufficient azimuthal symmetry, axial uniformity and density to perform as high quality impactors on central, cylindrical targets. Scientific applications of such li… more
Date: December 31, 1996
Creator: Reinovsky, R. E. & Ekdahl, C. A.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
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ECR etching of GaP, GaAs, InP, and InGaAs in Cl{sub 2}/Ar, Cl{sub 2}/N{sub 2}, BCl{sub 3}/Ar, and BCl{sub 3}/N{sub 2}

Description: Electron cyclotron resonance (ECR) etching GaP, GaAs, InP, and InGaAs are reported as a function of percent chlorine-containing gas for Cl{sub 2}/Ar, Cl{sub 2}/N{sub 2}, BCl{sub 3}/Ar, and BCl{sub 3}N{sub 2} plasma chemistries. GaAs and GaP etch rates were faster than InP and InGaAs, independent of plasma chemistry due to the low volatility of the InCl{sub x} etch products. GaAs and GaP etch rates increased as %Cl{sub 2} was increased for Cl{sub 2}/Ar and Cl{sub 2}/N{sub 2} plasmas. The GaAs an… more
Date: June 1, 1996
Creator: Shul, R. J.; Baca, A. G.; Rieger, D. J.; Hou, H.; Pearton, S. J. & Ren, F.
Item Type: Refine your search to only Report
Partner: UNT Libraries Government Documents Department
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Procyon high explosive pulsed power experiments

Description: Procyon is a two-stage explosive pulsed-power system, consisting of a MK-IX helical generator and an explosively formed fuse (EFF) opening switch. A complete assembly including load and diagnostics is shown. The system was originally developed for the purpose of powering plasma z-pinch experiments and, in its original concept, was coupled to the plasma z-pinch load through a third pulsed power stage, a plasma flow switch (PFS). The authors have performed plasma z-pinch experiments both with and… more
Date: September 1, 1996
Creator: Goforth, J.H.; Oona, H. & Anderson, B.G.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
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Progress towards a 20 kV, 2 kA plasma source ion implantation modulator for automotive production of diamond film on aluminum

Description: This paper provides the process requirements and the electrical design topology being developed to facilitate large scale production of amorphous diamond films on aluminum. The patented recipe, that includes other surface modification processes, requires various operational voltages, duty cycles, and current load regimes to ensure a high quality film. It is desirable to utilize a common modulator design for this relatively low voltage recipe. Processing may include target part cleaning, ion imp… more
Date: November 1, 1996
Creator: Reass, W.A.; Munson, C.A.; Malaczynski, G. & Elmoursi, A.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
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Metallization technology for tenth-micron range integrated circuits. CRADA final report for CRADA number ORNL92-0104

Description: A critical step in the fabrication of integrated circuits is the deposition of metal layers which interconnect the various circuit elements that have been formed in earlier process steps. In particular, columns of metal 2-3 times higher than the characteristic dimension of the circuit are needed. At the time of initiation of this CRADA, the state-of-the-art was the production of 1-1.5 micron-high columns for 0.5 micron-wide features with an expected reduction in size by a factor of two or more … more
Date: April 11, 1996
Creator: Berry, L.A.; Gorbatkin, S.M.; Rossnagel, S.M. & Harper, J.M.E.
Item Type: Refine your search to only Report
Partner: UNT Libraries Government Documents Department
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Modification of cathodic arc deposition profiles by magnetic multicusps

Description: The deposition profile of a cathodic arc plasma source with and without magnetic macroparticle filter has been measured using a deposition probe technique. It has been found that the profile is close to a Gaussian and that the width of the profile depends on the cathode material. It was found that the dependence on the cathode material leads to a considerable radial variation of the elemental composition of the film when an alloy cathode is used. A magnetic multicusp field (magnetic bucket) nea… more
Date: April 1, 1996
Creator: Anders, S.; MacGill, R. A.; Raoux, S. & Brown, I. G.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
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Computational and experimental investigation of magnetized target fusion

Description: In Magnetized Target Fusion (MTF), a preheated and magnetized target plasma is hydrodynamically compressed to fusion conditions. Because the magnetic field suppresses losses by electron thermal conduction in the fuel during the target implosion heating process, the compression may be over a much longer time scale than in traditional inertial confinement fusion (ICF). Bigger targets and much lower initial target densities than in ICF can be used, reducing radiative energy losses. Therefore, ``li… more
Date: July 1, 1996
Creator: Sheehey, P. T.; Guzik, J. A.; Kirkpatrick, R. C.; Lindemuth, I. R.; Scudder, D. W.; Shlachter, J. S. et al.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
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Z-pinch diagnostics, plasma and liner instabilities and new x-ray techniques

Description: Pulse power experiments of the last several decades have contributed greatly to the understanding of high temperature and high density plasmas and, more recently, to the study of hydrodynamic effects in thick imploding cylinders. Common to all these experiments is the application of a large current pulse to a cylindrically symmetric load, with the resulting Lorenz force compressing the load to produce hydrodynamic motion and/or high temperature, high density plasma. In Los Alamos, Pulsed power … more
Date: September 1, 1996
Creator: Oona, H.; Anderson, B. & Benage, J.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
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Cathodic arc modulator systems for metallic plasma ion implantation

Description: This paper describes the electrical design and operation of a cathodic arc modulator system for metallic plasma ion implantation. Depending on the ion implantation process recipe, various repetition rates, pulse widths, and currents are required. In addition, the cathodic arc system may be synchronized with a higher voltage target modulator system. The cathodic arc is water cooled and usually uses a self generated axial B-field, by use of a series connected solenoid around the arc anode. Typica… more
Date: November 1, 1996
Creator: Reass, W.A. & Wood, B.P.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
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Vacuum-spark metal ion source based on a modified Marx generator

Description: The plasma generating parts of ion sources including their power supplies are usually floated to high potential (ion extraction voltage), thus requiring great insulation efforts and high costs for high-energy ion beams. A new concept for pulsed ion sources is presented in which a single power supply is used to simultaneously produce the plasma and high extractor voltage via a modified Marx generator. Proof-of-principle experiments have been performed with high-current spark discharges in vacuum… more
Date: April 1, 1996
Creator: Anders, A.; Brown, I.G.; MacGill, R.A. & Dickinson, M.R.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
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Parametric study of compound semiconductor etching utilizing inductively coupled plasma source

Description: Inductively Coupled Plasma (ICP) sources are extremely promising for large-area, high-ion density etching or deposition processes. In this review the authors compare results for GaAs and GaN etching with both ICP and Electron Cyclotron Resonance (ECR) sources on the same single-wafer platform. The ICP is shown to be capable of very high rates with excellent anisotropy for fabrication of GaAs vias or deep mesas in GaAs or GaN waveguide structures.
Date: July 1, 1996
Creator: Constantine, C.; Johnson, D. & Barratt, C.
Item Type: Refine your search to only Report
Partner: UNT Libraries Government Documents Department
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Analysis of filtered silicon diode data from the MAGO II and MAGO III experiments

Description: The magnetic compression (MAGO) experiments were conceived by the All-Russia Scientific Institute for Experimental Physics (VNIIEF) several years ago, and only recently has Los Alamos National Laboratory (LANL) participated in joint US/Russian experiments intended to combine the advanced US diagnostic technology with the unsurpassed explosive pulsed power technology fielded by VNIIEF. On two of the four joint LANL/VNIIEF magnetized plasma generation (MAGO) experiments fielded thus far, filtered… more
Date: September 1, 1996
Creator: Kirkpatrick, Ronald C. & Idzorek, George
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
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Ion energy and angular distributions in inductively driven RF discharges in chlorine

Description: In this paper, the authors report values of ion energy distributions and ion angular distributions measured at the grounded electrode of an inductively-coupled discharge in pure chlorine gas. The inductive drive in the GEC reference cell produced high plasma densities (10{sup 11}/cm{sup 3} electron densities) and stable plasma potentials. As a result, ion energy distributions typically consisted of a single peak well separated from zero energy. Mean ion energy varied inversely with pressure, de… more
Date: March 1, 1996
Creator: Woodworth, J. R.; Riley, M. E. & Hamilton, T. W.
Item Type: Refine your search to only Report
Partner: UNT Libraries Government Documents Department
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Metal plasma immersion ion implantation and deposition: A review

Description: Metal Plasma Immersion Ion Implantation and Deposition (MePIIID) is a hybrid process combining cathodic arc deposition and plasma immersion ion implantation. The properties of metal plasma produced by vacuum arcs are reviewed and the consequences for MePIIID are discussed. Different version of MePIIID are described and compared with traditional methods of surface modification such as ion beam assisted deposition (IBAD). MePIIID is a very versatile approach because of the wide range of ion speci… more
Date: September 1, 1996
Creator: Anders, A.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
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