Ion energy and angular distributions in inductively driven RF discharges in chlorine

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In this paper, the authors report values of ion energy distributions and ion angular distributions measured at the grounded electrode of an inductively-coupled discharge in pure chlorine gas. The inductive drive in the GEC reference cell produced high plasma densities (10{sup 11}/cm{sup 3} electron densities) and stable plasma potentials. As a result, ion energy distributions typically consisted of a single peak well separated from zero energy. Mean ion energy varied inversely with pressure, decreasing from 13 to 9 eV as the discharge pressure increased from 20 to 60 millitorr. Half-widths of the ion angular distributions in these experiments varied from ... continued below

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29 p.

Creation Information

Woodworth, J.R.; Riley, M.E. & Hamilton, T.W. March 1, 1996.

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Authors

  • Woodworth, J.R.
  • Riley, M.E. Sandia National Labs., Albuquerque, NM (United States). Laser, Optics, and Remote Sensing Dept.
  • Hamilton, T.W. Applied Physics International, Inc., Albuquerque, NM (United States)

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

In this paper, the authors report values of ion energy distributions and ion angular distributions measured at the grounded electrode of an inductively-coupled discharge in pure chlorine gas. The inductive drive in the GEC reference cell produced high plasma densities (10{sup 11}/cm{sup 3} electron densities) and stable plasma potentials. As a result, ion energy distributions typically consisted of a single peak well separated from zero energy. Mean ion energy varied inversely with pressure, decreasing from 13 to 9 eV as the discharge pressure increased from 20 to 60 millitorr. Half-widths of the ion angular distributions in these experiments varied from 6 to 7.5 degrees, corresponding to transverse energies from 0.13 to 0.21 eV. Ion energies gradually dropped with time, probably due to the buildup of contaminants on the chamber walls. Cell temperature also was an important variable, with ion fluxes to the lower electrode increasing and the ion angular distribution narrowing as the cell temperature increased. Plasmas discharges are widely used to etch semiconductors, oxides and metals in the fabrication of integrated circuits.

Physical Description

29 p.

Notes

OSTI as DE96010901

Source

  • Other Information: PBD: Mar 1996

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  • Other: DE96010901
  • Report No.: SAND--96-0559
  • Grant Number: AC04-94AL85000
  • DOI: 10.2172/231654 | External Link
  • Office of Scientific & Technical Information Report Number: 231654
  • Archival Resource Key: ark:/67531/metadc673161

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Creation Date

  • March 1, 1996

Added to The UNT Digital Library

  • June 29, 2015, 9:42 p.m.

Description Last Updated

  • April 13, 2016, 2:41 p.m.

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Woodworth, J.R.; Riley, M.E. & Hamilton, T.W. Ion energy and angular distributions in inductively driven RF discharges in chlorine, report, March 1, 1996; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc673161/: accessed October 20, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.