Metal plasma immersion ion implantation and deposition: A review

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Metal Plasma Immersion Ion Implantation and Deposition (MePIIID) is a hybrid process combining cathodic arc deposition and plasma immersion ion implantation. The properties of metal plasma produced by vacuum arcs are reviewed and the consequences for MePIIID are discussed. Different version of MePIIID are described and compared with traditional methods of surface modification such as ion beam assisted deposition (IBAD). MePIIID is a very versatile approach because of the wide range of ion species and energies used. In one extreme case, films are deposited with ions in the energy range 20--50 eV, and at the other extreme, ions can be ... continued below

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33 p.

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Anders, A. September 1, 1996.

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  • Anders, A. Lawrence Berkeley National Lab., CA (United States). Accelerator and Fusion Research Div.

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Description

Metal Plasma Immersion Ion Implantation and Deposition (MePIIID) is a hybrid process combining cathodic arc deposition and plasma immersion ion implantation. The properties of metal plasma produced by vacuum arcs are reviewed and the consequences for MePIIID are discussed. Different version of MePIIID are described and compared with traditional methods of surface modification such as ion beam assisted deposition (IBAD). MePIIID is a very versatile approach because of the wide range of ion species and energies used. In one extreme case, films are deposited with ions in the energy range 20--50 eV, and at the other extreme, ions can be implanted with high energy (100 keV or more) without film deposition. Novel features of the technique include the use of improved macroparticle filters; the implementation of several plasma sources for multi-element surface modification; tuning of ion energy during implantation and deposition to tailor the substrate-film intermixed layer and structure of the growing film; simultaneous pulsing of the plasma potential (positive) and substrate bias (negative) with a modified Marx generator; and the use of high ion charge states.

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33 p.

Notes

OSTI as DE97001256

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  • 3. international workshop on plasma-based ion implantation, Dresden (Germany), 15-18 Sep 1996

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  • Other: DE97001256
  • Report No.: LBNL--38910
  • Report No.: CONF-9609269--2
  • Grant Number: AC03-76SF00098
  • Office of Scientific & Technical Information Report Number: 414413
  • Archival Resource Key: ark:/67531/metadc674685

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Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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  • September 1, 1996

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  • July 25, 2015, 2:20 a.m.

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  • April 5, 2016, 5:02 p.m.

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Anders, A. Metal plasma immersion ion implantation and deposition: A review, article, September 1, 1996; California. (digital.library.unt.edu/ark:/67531/metadc674685/: accessed December 11, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.