Three-degree-of-freedom optic mount for extreme ultraviolet lithography
Description:
A mechanism to finely align optics for extreme ultraviolet lithography applications is presented. The mechanism is a small motion parallel link manipulator with flexure joints that exhibits nanometer level positioning capability. Performance results of a prototype system are given in this paper.
Date:
August 27, 1998
Creator:
Hale, L.; Jensen, S.; Malsbury, T.; Parker, J. & Tajbakhsh, H.
Item Type:
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UNT Libraries Government Documents Department