Fabrication and testing of optics for EUV projection lithography

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Extreme Ultraviolet Lithography (EUVL) is a leading candidate as a stepper technology for fabricating the ``0.1 {micro}m generation`` of microelectronic circuits. EUVL is an optical printing technique qualitatively similar to Deep UV Lithography (DUVL), except that 11-13nm wavelength light is used instead of 193-248nm. The feasibility of creating 0.l{micro}m features has been well-established using small-field EWL printing tools, and development efforts are currently underway to demonstrate that cost-effective production equipment can be engineered to perform full-width ring-field imaging consistent with high wafer throughput rates. Ensuring that an industrial supplier base will be available for key components and subsystems is crucial ... continued below

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6 p.

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Taylor, J. S. March 13, 1998.

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Description

Extreme Ultraviolet Lithography (EUVL) is a leading candidate as a stepper technology for fabricating the ``0.1 {micro}m generation`` of microelectronic circuits. EUVL is an optical printing technique qualitatively similar to Deep UV Lithography (DUVL), except that 11-13nm wavelength light is used instead of 193-248nm. The feasibility of creating 0.l{micro}m features has been well-established using small-field EWL printing tools, and development efforts are currently underway to demonstrate that cost-effective production equipment can be engineered to perform full-width ring-field imaging consistent with high wafer throughput rates. Ensuring that an industrial supplier base will be available for key components and subsystems is crucial to the success of EUVL. In particular, the projection optics are the heart of the EUVL imaging system, yet they have figure and finish specifications that are beyond the state-of-the-art in optics manufacturing. Thus it is important to demonstrate that industry will be able to fabricate and certify these optics commensurate with EUVL requirements. The goal of this paper is to demonstrate that procuring EUVL projection optical substrates is feasible. This conclusion is based on measurements of both commercially-available and developmental substrates.

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6 p.

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OSTI as DE98058758

Other: FDE: PDF; PL:

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  • 1998 diffractive optic and micro optics conference, Kailua, HI (United States), 8-12 Jun 1998

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  • Other: DE98058758
  • Report No.: UCRL-JC--128290
  • Report No.: CONF-980636--
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 300045
  • Archival Resource Key: ark:/67531/metadc685285

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • March 13, 1998

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  • July 25, 2015, 2:20 a.m.

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  • April 6, 2017, 5:50 p.m.

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Taylor, J. S. Fabrication and testing of optics for EUV projection lithography, article, March 13, 1998; California. (digital.library.unt.edu/ark:/67531/metadc685285/: accessed November 22, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.