Rigorous method for compensation selection and alignment of microlithographic optical systems

PDF Version Also Available for Download.

Description

The assembly of an optical system requires the correction of aberrations in the entire imaging field by making selected rigid-body motions of the optical elements. We present a rigorous method for determining which adjustment motions, called compensators, to use for alignment. These compensators are found by employing techniques from linear algebra that choose the most independent vectors from a set which are interdependent. The method finds the smallest number of compensators to correct for misalignments of a given magnitude. As an example the method is applied to a four-mirror scanning ring-field EUV lithography system. It is shown that out of ... continued below

Physical Description

15 p.

Creation Information

Chapman, H.N. & Sweeney, D.W. March 25, 1998.

Context

This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 44 times . More information about this article can be viewed below.

Who

People and organizations associated with either the creation of this article or its content.

Sponsor

Publisher

Provided By

UNT Libraries Government Documents Department

Serving as both a federal and a state depository library, the UNT Libraries Government Documents Department maintains millions of items in a variety of formats. The department is a member of the FDLP Content Partnerships Program and an Affiliated Archive of the National Archives.

Contact Us

What

Descriptive information to help identify this article. Follow the links below to find similar items on the Digital Library.

Description

The assembly of an optical system requires the correction of aberrations in the entire imaging field by making selected rigid-body motions of the optical elements. We present a rigorous method for determining which adjustment motions, called compensators, to use for alignment. These compensators are found by employing techniques from linear algebra that choose the most independent vectors from a set which are interdependent. The method finds the smallest number of compensators to correct for misalignments of a given magnitude. As an example the method is applied to a four-mirror scanning ring-field EUV lithography system. It is shown that out of 32 degrees of freedom in the configuration of the optical elements, only eight compensators are required on the optics. By adjusting these compensators a misaligned configuration giving a 30 {lambda} wavefront error can be assembled to {lambda}/50 in the absence of measurement noise.

Physical Description

15 p.

Notes

OSTI as DE98054775

Other: FDE: PDF; PL:

Source

  • 23. SPIE annual international symposium on microlithography conference, Santa Clara, CA (United States), 22-27 Feb 1998

Language

Item Type

Identifier

Unique identifying numbers for this article in the Digital Library or other systems.

  • Other: DE98054775
  • Report No.: UCRL-JC--130304
  • Report No.: CONF-980225--
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 651471
  • Archival Resource Key: ark:/67531/metadc709579

Collections

This article is part of the following collection of related materials.

Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

What responsibilities do I have when using this article?

When

Dates and time periods associated with this article.

Creation Date

  • March 25, 1998

Added to The UNT Digital Library

  • Sept. 12, 2015, 6:31 a.m.

Description Last Updated

  • April 10, 2017, 1:46 p.m.

Usage Statistics

When was this article last used?

Yesterday: 0
Past 30 days: 1
Total Uses: 44

Interact With This Article

Here are some suggestions for what to do next.

Start Reading

PDF Version Also Available for Download.

International Image Interoperability Framework

IIF Logo

We support the IIIF Presentation API

Chapman, H.N. & Sweeney, D.W. Rigorous method for compensation selection and alignment of microlithographic optical systems, article, March 25, 1998; California. (digital.library.unt.edu/ark:/67531/metadc709579/: accessed December 13, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.