The ability to fabricate membranes with arrays of apertures only a few nanometers in diameter are important to many fields of research, including ion beam lithography, DNA sequencing, single ion implantations, and single molecule studies. Because even the state-of-the-art lithography tools are limited in their ability to produce nanoscale features, alternative methods of fabricating single pores of nanometer scale have been developed, using ion-beam sculpting and focused-ion-beam assisted deposition. However, these methods cannot simultaneously produce multiple holes of nanometer dimension. Here we report a means of forming arrays of nanopores simultaneously on a thin, solid-state membrane using plasma-based thin-film deposition. …
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Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (United States)
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The ability to fabricate membranes with arrays of apertures only a few nanometers in diameter are important to many fields of research, including ion beam lithography, DNA sequencing, single ion implantations, and single molecule studies. Because even the state-of-the-art lithography tools are limited in their ability to produce nanoscale features, alternative methods of fabricating single pores of nanometer scale have been developed, using ion-beam sculpting and focused-ion-beam assisted deposition. However, these methods cannot simultaneously produce multiple holes of nanometer dimension. Here we report a means of forming arrays of nanopores simultaneously on a thin, solid-state membrane using plasma-based thin-film deposition. By depositing layers of metallic thin films, the aperture sizes of pores in a pre-fabricated membrane can be reduced from a couple of micrometers down to tens of nanometers and even smaller. The technique offers a way to reduce the sizes of aperture of any shape in a variety of substrate materials, both conducting and insulating. Such arrays of nanopores can serve as membrane channels for DNA sequencing, as masks in ion-beam imprinters, for the fabrication of quantum dots, and in other applications.
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Ji, Qing; Chen, Y.; Jiang, Ximan; Ji, Lili & Leung, K. N.Formation of Nanopore-Arrays by Plasma-based Thin FilmDeposition,
report,
March 18, 2005;
Berkeley, California.
(https://digital.library.unt.edu/ark:/67531/metadc902676/:
accessed July 16, 2024),
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