In-Situ observation of wet oxidation kinetics on Si (100) via ambient pressure x-ray photoemission spectroscopy Page: 1 of 16
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In-situ observation of wet oxidation kinetics on Si(100)
via ambient pressure x-ray photoemission spectroscopy
Massimiliano Rossi', Bongjin S. Mun' *, Yoshiharu Enta3*, Charles S. Fadley1'4'8,
Ki-Suk Lees, Sang-Koog Kim5, Hyun-Joon Shin6, Zahid Hussain', Philip N. Ross Jr.7
'Advanced Light Source, Lawrence Berkeley National Laboratory,
Berkeley, California 94720, USA
2 Department of Applied Physics, Hanyang University, Ansan, Kyeonggi 426-791, Korea,
3Faculty of Science and Technology, Hirosaki University,
3 Bunkyo-cho, Hirosaki 036-8561, Japan
4Department of Physics, University of California-Davis, Davis, California 95616, USA
5Research Center for Spin Dynamics & Spin-Wave Devices, and Nanospintronics
Laboratory, Department of Materials Science and Engineering, College of Engineering,
Seoul National University, Seoul 151-744, South Korea
6 Pohang Accelerator Laboratory, POSTECH,
Hyoja Dong, Namgu, Pohang, Kyungbuk, 790-784, Korea
Material Sciences Division, Lawrence Berkeley National Laboratory, Berkeley,
California 94720, USA
8Institute for Solid State Research, Juelich Research Center, DE-52425 Juelich, Germany
* Corresponding authors: BSMun a lbl.gov, enta@cc.hirosaki-u.ac.jp
Abstract
The initial stages of wet thermal oxidation of Si(100)-(2x1) have been
investigated by in-situ ambient pressure x-ray photoemission spectroscopy (APXPS),
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Hussain, Zahid; Rossi, Massimiliano; Mun, Bongjin S.; Enta, Yoshiharu; Fadley, Charles S.; Lee, Ki-Suk et al. In-Situ observation of wet oxidation kinetics on Si (100) via ambient pressure x-ray photoemission spectroscopy, article, August 24, 2007; Berkeley, California. (https://digital.library.unt.edu/ark:/67531/metadc896688/m1/1/: accessed April 26, 2024), University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu; crediting UNT Libraries Government Documents Department.