The advent of UHV medium voltage electron microscopes has brought the microanalyst to a regime of operating conditions in which electron beam induced damage can now be introduced to metallic specimens of medium to high atomic number. We report upon calculations of electron beam induced atomic sputtering which will have bearing upon the next generation of medium voltage analytical electron microscopes. The cross-section calculations reported herein have been completed for all solid elements of the periodic table for incident electron energies up to 1.5 MeV. All computer codes needed to duplicate these computations are available through the EMMPDL. 12 refs., …
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The advent of UHV medium voltage electron microscopes has brought the microanalyst to a regime of operating conditions in which electron beam induced damage can now be introduced to metallic specimens of medium to high atomic number. We report upon calculations of electron beam induced atomic sputtering which will have bearing upon the next generation of medium voltage analytical electron microscopes. The cross-section calculations reported herein have been completed for all solid elements of the periodic table for incident electron energies up to 1.5 MeV. All computer codes needed to duplicate these computations are available through the EMMPDL. 12 refs., 2 figs., 1 tab.
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Bradley, C.R. & Zaluzec, N.J.Atomic sputtering in the analytical electron microscope,
article,
August 1, 1988;
Illinois.
(https://digital.library.unt.edu/ark:/67531/metadc1196238/:
accessed May 15, 2024),
University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu;
crediting UNT Libraries Government Documents Department.
