A High-Intensity, RF Plasma-Sputter Negative Ion Source
Description:
A high-intensity, plasma-sputter negative-ion source based on the use of RF power for plasma generation has been developed that can be operated in either pulsed or dc modes. The source utilizes a high-Q, self-igniting, inductively coupled antenna system, operating at 80 MHz that has been optimized to generate Cs-seeded plasmas at low pressures (typically, <1 mTorr for Xe). The source is equipped with a 19-mm diameter spherical-sector cathode machined from the desired material. To date, the s…
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Date:
March 2, 1999
Creator:
Alton, G. D.; Bao, Y.; Cui, B.; Lohwasser, R.; Reed, C. A. & Zhang, T.
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