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Structure and Electrochemical Properties of LiMn2O4 Thin Films

Description: The structure and electrochemical properties of LiMn{sub 2}O{sub 4} films depend upon the deposition and annealing conditions. Films which were deposited by rf magnetron sputtering of LiMn{sub 2}O{sub 4} in Ar + N{sub 2} gas mixtures and annealed in O{sub 2} at temperatures between 400 to 1000{degrees}C had the cubic spinel structure with an a-axis length that increased linearly from 8.13 to 8.25 {Angstrom} with increasing anneal temperature. Thin-film lithium cells with cathodes of different a… more
Date: November 1, 1998
Creator: Bates, J.B.; Ueda, A. & Zuhr, R.A.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
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3d-Metal Doped into LiMn2O4 Thin Films

Description: 3d-metal (Me) doped LiMn{sub 2}O{sub 4} thin films were deposited by rf magnetron sputtering of Li[Mn{sub 1.9}Me{sub 0.1}]O{sub 4} targets in Ar + N{sub 2} and Ar + O{sub 2} gas mixtures and annealed at 750{degrees}C in O{sub 2} for 1 h. From XRD measurements, the structure of the Me-doped thin film was dependent upon the element and the deposition conditions. The doping level of Me/Mn of cubic phase was less than 0.1 by EDX measurements. The Ti-LiMn{sub 2}O{sub 4} films exhibited a capacity cl… more
Date: November 1, 1998
Creator: Bates, J.B.; Ueda, A. & Zuhr, R.A.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
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