A debris free, electron beam driven, lithography source at 130 [angstrom]
Description:
Los Alamos and Grumman are cooperatively investigating a debris free source for EUV lithography. This source utilizes the predicted anomalous energy loss of a short pulse electron beam in a preformed plasma to heat and ionize the ions to a charge state where efficient radiation at 130[angstrom] occurs. Accelerators developed for the free electron laser program at Los Alamos are used as the electron bunch source. These accelerators use a laser driven photocathode to produce 15 psec electron bunc…
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Date:
January 1, 1994
Creator:
Fulton, R. D.; Abdallah, J.; Goldstein, J. C.; Jones, M. E.; Kilcrease, D. P.; Kinross-Wright, J. M. et al.
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