A microwave plasma cleaning apparatus

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Description

In a microwave electron cyclotron resonance plasma source, reactive plasmas of oxygen and its mixtures of argon have been used for evaluating plasma cleaning technologies. Small aluminum samples (0.95 x 1.9 cm) were coated with thin films ({le} 20 {micro}m in thickness) of Shell Vitrea oil and cleaned with reactive plasmas. The discharge parameters, such as gas pressure, magnetic field, substrate biasing, and microwave power, were varied to change cleaning conditions. A mass spectroscopy (or residual gas analyzer) was used to monitor the status of plasma cleaning. Mass loss of the samples after plasma cleaning was measured to estimate cleaning ... continued below

Physical Description

11 p.

Creation Information

Tsai, C.C.; Nelson, W.D.; Schechter, D.E.; Thompson, L.M. & Glover, A.L. December 31, 1994.

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Description

In a microwave electron cyclotron resonance plasma source, reactive plasmas of oxygen and its mixtures of argon have been used for evaluating plasma cleaning technologies. Small aluminum samples (0.95 x 1.9 cm) were coated with thin films ({le} 20 {micro}m in thickness) of Shell Vitrea oil and cleaned with reactive plasmas. The discharge parameters, such as gas pressure, magnetic field, substrate biasing, and microwave power, were varied to change cleaning conditions. A mass spectroscopy (or residual gas analyzer) was used to monitor the status of plasma cleaning. Mass loss of the samples after plasma cleaning was measured to estimate cleaning rates. Measured cleaning rates of low-pressure (0.5-mtorr) argon/oxygen plasmas were as high as 2.7 {micro}m/min. X-ray photoelectron spectroscopy was used to determine cleanliness of the sample surfaces. In this paper, significant results of the plasma cleaning are reported and discussed.

Physical Description

11 p.

Notes

OSTI as DE96004925

Source

  • Aerospace environmental technology conference, Huntsville, AL (United States), 10-11 Aug 1994

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  • Other: DE96004925
  • Report No.: CONF-9408174--4
  • Grant Number: AC05-84OR21400
  • DOI: 10.2172/188632 | External Link
  • Office of Scientific & Technical Information Report Number: 188632
  • Archival Resource Key: ark:/67531/metadc668717

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Creation Date

  • December 31, 1994

Added to The UNT Digital Library

  • June 29, 2015, 9:42 p.m.

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  • Jan. 19, 2016, 7:49 p.m.

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Tsai, C.C.; Nelson, W.D.; Schechter, D.E.; Thompson, L.M. & Glover, A.L. A microwave plasma cleaning apparatus, report, December 31, 1994; Tennessee. (digital.library.unt.edu/ark:/67531/metadc668717/: accessed September 25, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.