Holographic optical elements for the extreme-ultravioletregime
Description:
As the development of extreme ultraviolet (EUV) lithography progresses, interest grows in the extension of traditional optical components to the EUV regime. The strong absorption of EUV by most materials and its extremely short wavelength, however, makes it very difficult to implement many components that are commonplace in the longer wavelength regimes. One such component is the diffractive optical element used, for example, in illumination systems to efficiently generate modified pupil fills.…
more
Date:
August 14, 2006
Creator:
Naulleau, Patrick P.; Salmassi, Farhad; Gullikson, Eric M. & Anderson, Erik H.
Item Type:
Refine your search to only
Article
Partner:
UNT Libraries Government Documents Department