Processing-Structure-Property Relationships of Reactive Spark Plasma Sintered Boron Carbide-Titanium Diboride Composites

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Sintering parameter effects on the microstructure of boron carbide and boron carbide/titanium diboride composites are investigated. The resulting microstructure and composition are characterized by scanning electron microscopy (SEM), x-ray microscopy (XRM) and x-ray diffraction (XRD). Starting powder size distribution effects on microstructure are present and effect the mechanical properties. Reactive spark plasma sintering introduces boron nitride (BN) intergranular films (IGF's) and their effects on fracture toughness, hardness and flexural strength are shown. Mechanical testing of Vickers hardness, 3-point bend and Chevron notch was done and the microstructural effects on the resulting mechanical properties are investigated.

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viii, 38 pages

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Lide, Hunter August 2019.

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Sintering parameter effects on the microstructure of boron carbide and boron carbide/titanium diboride composites are investigated. The resulting microstructure and composition are characterized by scanning electron microscopy (SEM), x-ray microscopy (XRM) and x-ray diffraction (XRD). Starting powder size distribution effects on microstructure are present and effect the mechanical properties. Reactive spark plasma sintering introduces boron nitride (BN) intergranular films (IGF's) and their effects on fracture toughness, hardness and flexural strength are shown. Mechanical testing of Vickers hardness, 3-point bend and Chevron notch was done and the microstructural effects on the resulting mechanical properties are investigated.

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viii, 38 pages

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  • August 2019

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  • Aug. 29, 2019, 10:25 a.m.

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Lide, Hunter. Processing-Structure-Property Relationships of Reactive Spark Plasma Sintered Boron Carbide-Titanium Diboride Composites, thesis, August 2019; Denton, Texas. (https://digital.library.unt.edu/ark:/67531/metadc1538698/: accessed July 18, 2024), University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu; .

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