Laser conditioning and electronic defect measurements of HfO sub 2 and SiO sub 2 thin films
Description:
Multilayer HfO{sub 2}/SiO{sub 2} high reflectors (HR) and polarizers show a permanent increase in their 1064-nm damage thresholds following laser conditioning at subthreshold fluences. Threshold increases of 2--3x are typical. In an effort to better understand the conditioning effect we have made laser conditioning and electronic property measurements on single layers of these two materials. The laser damage threshold of 1-{mu}m thick e-beam deposited SiO{sub 2} was increased by laser condition…
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Date:
December 17, 1990
Creator:
Kozlowski, M.R.; Staggs, M.; Rainer, F. (Lawrence Livermore National Lab., CA (USA)) & Stathis, J.H. (International Business Machines Corp., Yorktown Heights, NY (USA). Thomas J. Watson Research Center)
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