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Development of damage resistant sputtered oxide optical coatings for use at 248 NM

Description: This report summarizes the results of a six-month effort to develop damage-resistant Kr*F laser mirrors by using and refining reactive sputter deposition techniques for the fabricaton of multilayer oxide optical coatings. Mirror performance goals included a reflectivity of 99% at 248 nm and a laser damage threshold of 5 J/cm/sup 2/ for 20 ns pulses. Oxide multilayer coating combinations selected for development were SiO/sub 2//Al/sub 2/O/sub 3/, SiO/sub 2//HfO/sub 2/ and SiO/sub 2//Y/sub 2/O/su… more
Date: October 1, 1981
Creator: Pawlewicz, W. T.; Martin, P. M.; Hays, D. D. & Mann, I. B.
Partner: UNT Libraries Government Documents Department
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Recent developments in reactively sputtered optical thin films

Description: Highlights of a multiyear effort to develop new or improved thin film optical coating materials through the use of reactive sputtering techniques are presented. Reactive sputtering is shown to be an extremely versatile technique capable of synthesizing broad classes of materials in a straightfoward manner. The exceptional utility of sputtering for preparation of hard coatings such as oxides, nitrides and novel materials based on Si and Ge is described. Some of these coating materials cannot be … more
Date: December 1, 1981
Creator: Pawlewicz, W. T.; Martin, P. M.; Hays, D. D. & Mann, I. B.
Partner: UNT Libraries Government Documents Department
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Improved manufacturing techniques for RF and laser hardening of missile domes. Phase I. Technical report

Description: This report summarizes key results and accomplishements during the first year of a Manufacturing Methods and Technology project to adapt an existing Pacific Northwest Laboratory (PNL) optical coating capability developed for high-power fusion-laser applications to the case of rf and laser hardening of plastic missile domes used by the US Army (MICOM). The primary objective of the first year's work was to demonstrate rf hardening of Hellfire and Copperhead 1.06-micron missile domes by use of tra… more
Date: July 1, 1982
Creator: Pawlewicz, W. T.; Mann, I. B.; Martin, P. M.; Hays, D. D. & Graybeal, A. G.
Partner: UNT Libraries Government Documents Department
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Thermal conductivities of thin, sputtered optical films

Description: The normal component of the thin film thermal conductivity has been measured for the first time for several advanced sputtered optical materials. Included are data for single layers of boron nitride (BN), aluminum nitride (AIN), silicon aluminum nitride (Si-Al-N), silicon aluminum oxynitride (Si-Al-O-N), silicon carbide (SiC), and for dielectric-enhanced metal reflectors of the form Al(SiO{sub 2}/Si{sub 3}N{sub 4}){sup n} and Al(Al{sub 2}O{sub 3}/AIN){sup n}. Sputtered films of more conventiona… more
Date: May 1, 1991
Creator: Henager, C.H. Jr. & Pawlewicz, W.T.
Partner: UNT Libraries Government Documents Department
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Develop techniques for ion implantation of PLZT (lead-lanthanum-zirconate-titanate) for adaptive optics

Description: Research was conducted at Pacific Northwest Laboratory to develop high photosensitivity adaptive optical elements utilizing ion implanted lanthanum-doped lead-zirconate-titanate (PLZT). One centimeter square samples were prepared by implanting ferroelectric and anti-ferroelectric PLZT with a variety of species or combinations of species. These included Ne, O, Ni, Ne/Cr, Ne/Al, Ne/Ni, Ne/O, and Ni/O, at a variety of energies and fluences. An indium-tin oxide (ITO) electrode coating was designed … more
Date: July 1, 1987
Creator: Batishko, C. R.; Brimhall, J. L.; Pawlewicz, W. T.; Stahl, K. A. & Toburen, L. H.
Partner: UNT Libraries Government Documents Department
open access

Thermal conductivities of thin, sputtered optical films

Description: The normal component of the thin film thermal conductivity has been measured for the first time for several advanced sputtered optical materials. Included are data for single layers of boron nitride (BN), aluminum nitride (AIN), silicon aluminum nitride (Si-Al-N), silicon aluminum oxynitride (Si-Al-O-N), silicon carbide (SiC), and for dielectric-enhanced metal reflectors of the form Al(SiO{sub 2}/Si{sub 3}N{sub 4}){sup n} and Al(Al{sub 2}O{sub 3}/AIN){sup n}. Sputtered films of more conventiona… more
Date: May 1, 1991
Creator: Henager, C. H., Jr. & Pawlewicz, W. T.
Partner: UNT Libraries Government Documents Department
open access

Evaluation of critical materials for five advanced design photovoltaic cells with an assessment of indium and gallium

Description: The objective of this study is to identify potential material supply constraints due to the large-scale deployment of five advanced photovoltaic (PV) cell designs, and to suggest strategies to reduce the impacts of these production capacity limitations and potential future material shortages. This report presents the results of the screening of the five following advanced PV cell designs: polycrystalline silicon, amorphous silicon, cadmium sulfide/copper sulfide frontwall, polycrystalline galli… more
Date: May 1, 1980
Creator: Watts, R. L.; Gurwell, W. E.; Jamieson, W. M.; Long, L. W.; Pawlewicz, W. T.; Smith, S. A. et al.
Partner: UNT Libraries Government Documents Department
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