Positron implantation profiles in elemental and multilayer systems
Description:
Different Monte Carlo schemes for modeling positron and electron implantation in solids have been briefly reviewed. Results (mean depth, backscattered fraction, profile shapes) of the Monte Carlo schemes are compared with experimental data and each other. Qualitatively, results of the different Monte Carlo schemes are the same; the most significant difference is in the value of the mean implantation depth. The scaled profiles (for positron implantation in any material) generated by the differen…
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Date:
July 1, 1994
Creator:
Ghosh, V. J.
Item Type:
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