Development of a Laboratory Extreme-Ultraviolet Lithography Tool
Description:
The development of a laboratory EUV lithography tool based on a laser plasma source, a 10x Schwarzchild camera, and a magnetically levitated wafer stage is presented. Interferometric measurements of the camera aberrations are incorporated into physical-optics simulations to estimate the EUV imaging performance of the camera. Experimental results demonstrate the successful matching of five multilayer reflecting surfaces, coated to specification for a wide range of figure and incidence angle requ…
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Date:
April 1, 1994
Creator:
Tichenor, D. A.; Kubiak, G. D.; Malinowski, M. E.; Stulen, R. H.; Haney, S. J.; Berger, K. W. et al.
Item Type:
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Partner:
UNT Libraries Government Documents Department