Carbon microstructures for electrochemical studies
Description:
Thin layers of photoresist were spin coated onto silicon wafers, and then carbonized to form smooth carbon films by heating in nitrogen for 1 hour at temperatures between 600 to 1100 C. Well-defined carbon microstructures on Si wafers that are being considered for electrodes in a microbattery concept were obtained by additional processing steps involving patterning and lithography of the photoresist prior to carbonization. The status of the fabrication of carbon microelectrodes obtained by pyro…
more
Date:
June 22, 2001
Creator:
Kostecki, Robert; Song, Xiang Yun & Kinoshita, Kim
Partner:
UNT Libraries Government Documents Department