Formation of Nanopore-Arrays by Plasma-based Thin FilmDeposition Page: 5 of 11
View a full description of this report.
Extracted Text
The following text was automatically extracted from the image on this page using optical character recognition software:
final aperture size can be achieved by monitoring the ion current that passes through the
aperture.
This method is useful for fabricating a variety of nano-structures. Similar shrinkage was
observed for several different geometries besides round holes, including rectangular slits.
The oval feature shown in Figure 4A maintained the same oval shape after the shrinkage,
as illustrated in Fig. 4D.
Formation of nanopore arrays using plasma-based thin-film deposition offers a promising
new approach for achieving feature sizes of nanometer scale with high throughput. The
technique will find many applications, including fabrication of masks for ion-beam
imprinter, implantation of quantum dots and wires, and the production of multiple
channels for DNA sequencing.
Acknowledgments
The work is supported by the Defense Advanced Research Projects Agency (DARPA)
and the U.S. Department of Energy under contract No. DE-AC03-76SF0098. Support
from staff members of the Plasma and Ion Source Technology Group in Lawrence
Berkeley National Laboratory is also gratefully acknowledged.
References:
[1] Jiang, X., Ji, Q., Ji, J., Chang, A., Leung, K.-N. Resolution improvement for a
maskless microion beam reduction lithography system. J. Vac. Sci. Technol. B21, 2724-
2727(2003).
[2] Li, J., Stein, D. McMullan, C., Branton D., Aziz, M. J., Golovchenko, J. A. Ion-beam
sculpting at nanometer length scales. Nature, 412, 166-169(2001).
Upcoming Pages
Here’s what’s next.
Search Inside
This report can be searched. Note: Results may vary based on the legibility of text within the document.
Tools / Downloads
Get a copy of this page or view the extracted text.
Citing and Sharing
Basic information for referencing this web page. We also provide extended guidance on usage rights, references, copying or embedding.
Reference the current page of this Report.
Ji, Qing; Chen, Y.; Jiang, Ximan; Ji, Lili & Leung, K. N. Formation of Nanopore-Arrays by Plasma-based Thin FilmDeposition, report, March 18, 2005; Berkeley, California. (https://digital.library.unt.edu/ark:/67531/metadc902676/m1/5/: accessed July 16, 2024), University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu; crediting UNT Libraries Government Documents Department.