Metal Oxide Reactions in Complex Environments: High Electric Fields and Pressures above Ultrahigh Vacuum Page: 58
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2.3.3. High Electric Field Stressing of Iron Oxides Formed at 300 K and 500 K
Fe oxide films formed at 300 K were exposed to high electric fields by
systematically increasing the bias voltage between the STM tip and the sample while in
constant current feedback. Under constant current feedback conditions, the onset ofnm
- 7.2
X5- 5.4
5
Y ..,4
3
2
4- 1
0 50 100 150 200 250
nm
yU50 100 150 200
Width (nm)(c)
X 1.0r0.8 1.6
Y
-0.2
Y o.9Voltage (V)
0.6 1.2
Fig. 2.6. Fe (111) surface after exposure to 02 at 500 K: (a) A 250 nm x 250 nm STM image after
1500 L 02 exposure (Vgap = 0.1 V, I= 0. 1 nA); (b) Line profile of the surface; (c) I/V spectra
for X and Y region.
breakdown was marked by a precipitous retreat of the tip from the sample surface (Fig.
2.7). The occurrence of dielectric breakdown was also marked by the appearance of a
feature that appeared as an elevation under constant current imaging (Fig. 2.8). As shown58
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8 (b)
6
4
2 -
0
-2
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Qin, Feili. Metal Oxide Reactions in Complex Environments: High Electric Fields and Pressures above Ultrahigh Vacuum, dissertation, August 2005; Denton, Texas. (https://digital.library.unt.edu/ark:/67531/metadc4843/m1/69/: accessed July 17, 2024), University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu; .