Industrial process driven system requirements for PSII applications
Description:
Plasma Source Ion Implantation (PSII) is a room temperature, plasma-based surface enhancement technology which is being commercialized through the efforts of a group of companies. A number of issues are critical to the successful design and operation of a commercial PSII system. These include overall vacuum system design, plasma source requirements and plasma-target interaction considerations, pulsed, high voltage sub-system (typically referred to as modulator) requirements, and target requirem…
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Date:
October 1, 1997
Creator:
Munson, C.P.
Item Type:
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UNT Libraries Government Documents Department