Study of the anisotropy of the threshold energy in copper using in-situ electrical resistivity measurements in the HVEM
Description: In the past, electrical-resistivity measurements and high voltage electron microscopy-(HVEM) have been used separately to investigate the anisotropy of the threshold energy for Frenkel-pair production. Electrical resistivity, measured in a conventional electron accelerator, has been used to observe small changes in the concentration of isolated Frenekel pairs at low temperatures, while HVEM experiments have focussed on the observation of measurable changes in visible defect clusters, primarily at elevated temperatures. However, quantitative comparison of the threshold energies obtained with the two techniques has proved difficult. As a first step toward resolving this dilemma, the threshold-energy surface for copper was determined by in-situ electrical-resistivity measurements below 10 K in the HVEM. By combining the advantages of both techniques, this approach allowed a precise and detailed study of the anisotropy of the threshold energy for Frenkel-pair production.
Date: January 1, 1980
Creator: King, W.E.; Merkle, K.L. & Meshii, M.
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