Epitaxial Pb(Zr{sub 0.40}Ti{sub 0.60})O{sub 3}/SrRuO{sub 3} and PbTiO{sub 3}/SrRuO{sub 3} multilayer thin films prepared by MOCVD and rf sputtering
Description:
Epitaxial SrRuO{sub 3} thin films were deposited by RF sputtering on SrTiO{sub 3} or MgO substrates for use as underlying electrodes. On these conductive substrates, epitaxial Pb(Zr{sub 0.35}Ti{sub 0.65})O{sub 3} (PZT) and PbTiO{sub 3} (PT) thin films were, deposited by metalorganic chemical vapor deposition (MOCVD). X-ray diffraction (XRD), RBS channeling (RBS), transmission electron microscopy (TEM) and optical waveguiding were used to characterize phase, microstructure, defect structure, ref…
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Date:
December 1, 1994
Creator:
Foster, C. M.; Csencsits, R. & Baldo, P. M.
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