Resistance behavior of Cr-Si-O thin films
Description:
Thin coatings of Cr-Si-O are assessed for use as a resistor. The submicron thick films are sputter deposited using a (l-x)Ar-(x)O{sub 2} working gas. Several compacts of metal and oxide powders are commercially prepared for use as the sputter targets. The deposition process yields film compositions which range from 2 to 30 at.% Cr and 20 to 45 at.% Si as measured using Rutherford backscattering. A broad range of resistivities from 10{sup 1} to 10{sup 14}{Omega} cm are found as measured through …
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Date:
October 23, 1996
Creator:
Jankowski, Alan Frederic; Hayes, Jeffrey P.; Musket, R.; Cosandey, F.; Gorla, Chandrasekhar E.; Besser, Ronald S. et al.
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