Resolution Improvement and Pattern Generator Development for theMaskless Micro-Ion-Beam Reduction Lithography System
Description:
The shrinking of IC devices has followed the Moore's Law for over three decades, which states that the density of transistors on integrated circuits will double about every two years. This great achievement is obtained via continuous advance in lithography technology. With the adoption of complicated resolution enhancement technologies, such as the phase shifting mask (PSM), the optical proximity correction (OPC), optical lithography with wavelength of 193 nm has enabled 45 nm printing by immer…
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Date:
May 18, 2006
Creator:
Jiang, Ximan
Partner:
UNT Libraries Government Documents Department