Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams
Description: Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position. Particle beams, including electrons, ions and neutral particles, may be used as well as electromagnetic radiation.
Date: April 10, 1991
Creator: Hawryluk, A. M. & Ceglio, N. M.
Partner: UNT Libraries Government Documents Department