Magnetron sputtered boron films and Ti/B multilayer structures
Description:
A method is described for the production of thin boron and titanium/boron films by magnetron sputter deposition. The amorphous boron films contain no morphological growth features, unlike those found when thin films are prepared by various physical vapor 5 deposition processes. Magnetron sputter deposition method requires the use of a high density crystalline boron sputter target which is prepared by hot isostatic pressing. Thin boron films prepared by this method are useful for ultra-thin band…
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Date:
March 11, 1991
Creator:
Makowiecki, Daniel Matthew & Jankowski, Alan Frederic
Partner:
UNT Libraries Government Documents Department