Reflection mass spectrometry technique for monitoring and controlling composition during molecular beam epitaxy
Description: This invention is comprised of a method for on-line accurate monitoring and precise control of molecular beam epitaxial growth of Groups III-III-V or Groups III-V-V layers in an advanced semiconductor device incorporates reflection mass spectrometry. The reflection mass spectrometry is responsive to intentional perturbations in molecular fluxes incident on a substrate by accurately measuring the molecular fluxes reflected from the substrate. The reflected flux is extremely sensitive to the state of the growing surface and the measurements obtained enable control of newly forming surfaces that are dynamically changing as a result of growth.
Date: August 15, 1990
Creator: Brennan, T. M.; Hammons, B. E. & Tsao, J. Y.
Partner: UNT Libraries Government Documents Department