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Tables of Spectral-Line Intensities: Part 1, Arranged by Elements

Description: From Abstract: "Comparisons with other other intensity measurements in individual spectra indicate that the National Bureau of Standards spectral-line intensities may have average errors of 20 percent, but first of all they provide uniform quantitative values for the seventy chemical elements commonly determined by spectrochemists. These data are presented by element in part I, and all 39000 observed lines are given in order of wavelength in part II."
Date: May 1975
Creator: Meggers, William F.; Corliss, Charles H. & Scribner, Bourdon F.
Partner: UNT Libraries Government Documents Department
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Tables of Spectral-Line Intensities: Part 2 - Arranged by Wavelengths

Description: From Preface: "This new edition of the NBS Tables of Spectral-Line Intensities incorporates three improvements on the original edition of 1961. In the original edition only about 25 000 of the 39 000 lines in the tables had been classified. In the ensuing thirteen years, about 8500 more lines (chiefly rare-earths) have been classified and the new classifications are here incorporated."
Date: May 1975
Creator: Meggers, William F.; Corliss, Charles H. & Scribner, Bourdon F.
Partner: UNT Libraries Government Documents Department
open access

Tables of Spectral-Line Intensities: Part 1, Arranged by Elements

Description: Abstract: "These data are presented by element in part I, and all 39,000 observed lines are given in order of wavelength in Part II." From Introduction: "In the beginning, most intensity data were reported on an arbitrary scale of 10 steps, weak lines being assigned an intensity of 1, and the strongest line intensity 10."
Date: December 29, 1961
Creator: Meggers, William F.; Corliss, Charles H. & Scribner, Bourdon F.
Partner: UNT Libraries Government Documents Department
open access

Tables of Spectral-Line Intensities: Part 2, Arranged by Wavelengths

Description: From Abstract: "Comparisons with other intensity measurements in individual spectra indicate that the National Bureau of Standards spectral-line intensities may have average errors of 20 percent, but first of all they provide uniform quantitative values for the seventy chemical elements commonly determined by spectrochemists. These data are presented by element in part I, and all 39,000 observed lines are given in order of wavelength in part II."
Date: October 2, 1961
Creator: Meggers, William F.; Corliss, Charles H. & Scribner, Bourdon F.
Partner: UNT Libraries Government Documents Department
open access

Table of Wavenumbers: Volume 2, 7000 A to 1000 mu

Description: Report discussing "A two-volume table for converting wavelengths in standard air to wavenumbers in vacuum. Wave-numbers are given to the nearest 0.001 K (cm^-1) for wavelengths from 2000 to 7000 A in volume 1, and 7000 A to 1000 m in volume II."
Date: May 16, 1960
Creator: Coleman, Charles DeWitt; Bozman, William R. & Meggers, William F.
Partner: UNT Libraries Government Documents Department
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Table of wavenumbers: Volume 1, 2000 A to 7000 A

Description: From Extension of Tables: "Because of its range and size, this table of wavenumbers is in two volumes, Volume I presenting wavenumbers for all wavelengths between 2000 and 7000 A, and Volume II giving wave-numbers for all wavelengths from 7000 A to 10000000 A=1 mm. In some cases Volume I may suffice for ionic spectra, and in others Volume II may be adequate for molecular spectra, but in general both volumes will needed to cover the entire range of spectral wavelengths measured in standard air."
Date: May 2, 1960
Creator: Coleman, Charles DeWitt; Bozman, William R. & Meggers, William F.
Partner: UNT Libraries Government Documents Department
open access

The Solar Spectrum 2935 Ã… to 8770 Ã… : Second Revision of Rowland's Preliminary Table of Solar Spectrum Wavelengths

Description: From Abstract: "An introductory text gives a detailed description of each column of the solar ledger. Tables include counts of lines of each spectrum recorded in the identification column, leading lines in the first and second spectra, and summaries of molecules and elements present in the sun. About 73 percent of the lines are wholly or partially identified. Sixty-three elements are recorded as present."
Date: December 1966
Creator: Moore, Charlotte E.; Minnaert, M. G. J. & Houtgast, J.
Partner: UNT Libraries Government Documents Department
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New Description of Thorium Spectra

Description: Report discussing wavelengths and estimated intensities in electrodeless lamp and spark sources presented for 15121 lines of ThI, ThII, ThIII, and ThIV in the spectral range from 2000 to 11550 A. Also contains tables of previously published interferometric values.
Date: June 21, 1960
Creator: Zalubas, Romuald
Partner: UNT Libraries Government Documents Department
open access

Laser Acoustic Microstructure Analysis at the Micron and Nanometer Length Scale

Description: Laser acoustic approaches to investigating the interaction of elastic waves with microstructure in materials is presented that probe both the micron and nanometer length scales. At the micron length scale, a full-field imaging approach is described that provides quantitative measurement of amplitude and phase of the out-of-plane acoustical motion at GHz frequencies. Specific lateral acoustic modes can be identified in addition to the primary thickness mode with spatial resolution sufficient to … more
Date: May 15, 2002
Creator: Telschow, K.L. & Hurley, D.H.
Partner: UNT Libraries Government Documents Department
open access

Collecting EUV mask images through focus by wavelength tuning

Description: Using an extreme-ultraviolet (EUV) microscope to produce high-quality images of EUV reticles, we have developed a new wavelength tuning method to acquire through-focus data series with a higher level of stability and repeatability than was previously possible. We utilize the chromatic focal-length dependence of a diffractive Fresnel zoneplate objective lens, and while holding the mask sample mechanically still, we tune the wavelength through a narrow range, in small steps. In this paper, we dem… more
Date: February 23, 2009
Creator: Goldberg, Kenneth A.; Mochi, Iacopo & Huh, Sungmin
Partner: UNT Libraries Government Documents Department
open access

The effect of temporal pulse shape on optical damage

Description: The conditions under which optical materials are susceptible to laser-induced damage is a topic which has been the subject of considerable study. Laser parameters such as wavelength and temporal pulse duration have been studied extensively. Until this work the effect of temporal pulse shape has not been considered. We present here data from a simple single-parameter model and a supporting experiment which predicts that a Flat-In-Time-pulse will produce damage at approximately 80% of the fluence… more
Date: August 15, 2006
Creator: Carr, C W; Trenholme, J B & Spaeth, M L
Partner: UNT Libraries Government Documents Department
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Assessing out-of-band flare effects at the wafer level for EUV lithography

Description: To accurately estimate the flare contribution from the out-of-band (OOB), the integration of a DUV source into the SEMATECH Berkeley 0.3-NA Micro-field Exposure tool is proposed, enabling precisely controlled exposures along with the EUV patterning of resists in vacuum. First measurements evaluating the impact of bandwidth selected exposures with a table-top set-up and subsequent EUV patterning show significant impact on line-edge roughness and process performance. We outline a simulation-based… more
Date: January 25, 2010
Creator: George, Simi; Naulleau, Patrick; Kemp, Charles; Denham, Paul & Rekawa, Senajith
Partner: UNT Libraries Government Documents Department
open access

The effect of multiple wavelengths on Laser-induced damage in DKDP crystals

Description: Laser-induced damage is a key factor that constrains how optical materials are used in high-power laser systems. In this work the size and density of bulk laser-induced damage sites formed during frequency tripling in a DKDP crystal are studied. The characteristics of the damage sites formed during tripling, where 1053-nm, 526-nm, and 351-nm light is simultaneously present, are compared to damage sites formed by 351-nm light alone. The fluence of each wavelength is calculated as a function of d… more
Date: July 11, 2005
Creator: Carr, C W & Auerbach, J M
Partner: UNT Libraries Government Documents Department
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Effects of Pulse Duration on Bulk Laser Damage in 350-nm Raster-Scanned DKDP

Description: In this paper we present the results of bulk damage experiments done on Type-I1 DKDP triple harmonic generator crystals that were raster conditioned with 351-355 nm wavelengths and pulse durations of 4 and 23.2 ns. In the first phase of experiments 20 different scan protocols were rastered into a sample of rapid growth DKDP. The sample was then rastered at damage-causing fluences to determine the three most effective protocols. These three protocols were scanned into a 15-cm sample of conventio… more
Date: October 30, 2002
Creator: Runkel, M.; Bruere, J.; Sell, W.; Weiland, T.; Milam, D.; Hahn, D. E. et al.
Partner: UNT Libraries Government Documents Department
open access

IR Properties of Ge-Doped CH - A Continuation

Description: We have reexamined Ge-doped CH and have found that the material is more reactive to air than previously understood. The Ge-doped material as formed shows by IR the presence of a Ge-H linkage that oxidizes rapidly, giving rise to a significant OH absorption. This broad peak impacts IR layering wavelengths of interest.
Date: April 4, 2003
Creator: Cook, Bob; Nikroo, Abbas & Czechowicz, Don
Partner: UNT Libraries Government Documents Department
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Sensitivity study of reliable, high-throughput resolution metricsfor photoresists

Description: The resolution of chemically amplified resists is becoming an increasing concern, especially for lithography in the extreme ultraviolet (EUV) regime. Large-scale screening and performance-based down-selection is currently underway to identify resist platforms that can support shrinking feature sizes. Resist screening efforts, however, are hampered by the absence of reliable resolution metrics that can objectively quantify resist resolution in a high-throughput fashion. Here we examine two high-… more
Date: July 30, 2007
Creator: Anderson, Christopher N. & Naulleau, Patrick P.
Partner: UNT Libraries Government Documents Department
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The effect of pulse duration on laser-induced damage by 1053-nm light in potassium dihydrogen phosphate crystals

Description: Laser induced damage in potassium dihydrogen phosphate (KDP) has previously been shown to depend significantly on pulse duration for 351-nm Gaussian pulses. In this work we studied the properties of damage initiated by 1053-nm temporally Gaussian pulses with 10ns and 3ns FWHM durations. Our results indicate that the number of damage sites induced by 1053-nm light scales with pulse duration ({tau}) as ({tau}{sub 1}/{tau}{sub 2}){sup 0.17} in contrast to the previously reported results for 351-nm… more
Date: November 27, 2006
Creator: Cross, D A; Braunstein, M R & Carr, C W
Partner: UNT Libraries Government Documents Department
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Extreme ultraviolet mask substrate surface roughness effects on lithography patterning

Description: In extreme ultraviolet lithography exposure systems, mask substrate roughness induced scatter contributes to LER at the image plane. In this paper, the impact of mask substrate roughness on image plane speckle is explicitly evaluated. A programmed roughness mask was used to study the correlation between mask roughness metrics and wafer plane aerial image inspection. We find that the roughness measurements by top surface topography profile do not provide complete information on the scatter relat… more
Date: June 21, 2010
Creator: George, Simi; Naulleau, Patrick; Salmassi, Farhad; Mochi, Iacopo; Gullikson, Eric; Goldberg, Kenneth et al.
Partner: UNT Libraries Government Documents Department
open access

Growth of Laser Damage in SiO2 under Multiple Wavelength Irradiation

Description: In laser systems using frequency conversion, multiple wavelengths will be present on optical components. We have investigated the growth of laser initiated damage in fused silica in the presence of multiple wavelengths. In particular, we measured growth at 351 nm in the presence of 1053 nm near the threshold of growth for 351 nm alone. The data shows that the sum fluence determines the onset of growth as well as the growth rate. The measured growth coefficient is consistent with all the energy … more
Date: October 28, 2005
Creator: Norton, M A; Donohue, E E; Feit, M D; Hackel, R P; Hollingsworth, W G; Rubenchik, A M et al.
Partner: UNT Libraries Government Documents Department
open access

Infrared Frequency Selective Surfaces Fabricated using Optical Lithography and Phase-Shift Masks

Description: A frequency selective surface (FSS) structure has been fabricated for use in a thermophotovoltaic system. The FSS provides a means for reflecting the unusable light below the bandgap of the thermophotovoltaic cell while transmitting the usable light above the bandgap. This behavior is relatively independent of the light's incident angle. The fabrication of the FSS was done using optical lithography and a phase-shift mask. The FSS cell consisted of circular slits spaced by 1100 nm. The diameters… more
Date: June 15, 2001
Creator: Spector, S.J.; Astolfi, D.K.; Doran, S.P.; Lyszczarz, T.M. & Raynolds, J.E.
Partner: UNT Libraries Government Documents Department
open access

Exploring the Potential of Table-Top X-Ray Lasers and Capillary Discharge for Applications

Description: The advantages of using of table top x-ray lasers (XRLs) for different applications have been described. Examples of the first successful use of XRLs, the current efforts in applying them and the potential applications where an XRL can be used in future have been discussed. Modeling results showing the possibility of 3-4 times shorter wavelength capillary discharge x-ray lasers and calculated spectrum of Xe capillary EUV source are presented.
Date: May 8, 2003
Creator: Shlyaptev, V. N.; Dunn, J.; Smith, R. F.; Moon, S. J.; Fournier, K. B.; Nilsen, J. et al.
Partner: UNT Libraries Government Documents Department
open access

Measuring the wavelengths of the Ni-like 4d <sup>1</sup>S<sub>0</sub> (arrow) 4p <sup>1</sup>P<sub>1</sub> and 4f <sup>1</sup>P<sub>1</sub> (arrow) 4d <sup>1</sup>P<sub>1</sub> x-ray laser lin

Description: In this work we present measurements of the wavelengths of the nickel-like 3d9 4d IS0 + 3d94p � P, X-ray laser line in several low-Z nickel-like ions ranging from yttrium (Z=39) to cadmium (Z=45). With the help of these laser results, we identify this line to very high accuracy in nonlasing plasmas from gallium (Z=3 1) to molybdenum (Z=42). The measured wavelengths are compared with optimized level calculations using the multi-configuration Dirac-Fock code of Grant et al. As an example, for ytt… more
Date: September 21, 1998
Creator: Churilov, S; Nilsen, J & Ryobtsev, A
Partner: UNT Libraries Government Documents Department
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Holographic optical elements for the extreme-ultravioletregime

Description: As the development of extreme ultraviolet (EUV) lithography progresses, interest grows in the extension of traditional optical components to the EUV regime. The strong absorption of EUV by most materials and its extremely short wavelength, however, makes it very difficult to implement many components that are commonplace in the longer wavelength regimes. One such component is the diffractive optical element used, for example, in illumination systems to efficiently generate modified pupil fills.… more
Date: August 14, 2006
Creator: Naulleau, Patrick P.; Salmassi, Farhad; Gullikson, Eric M. & Anderson, Erik H.
Partner: UNT Libraries Government Documents Department
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