Description: Several novel polysilanes synthesized by the free-radical hydrosilation of oligomeric polyphenylsilane or poly(p-tert- butylphenylsilane) were examined for lithographic behavior. This recently developed route into substituted polysilanes has allowed for the rational design of a variety of polysilanes with a typical chemical properties such as alcohol and aqueous base solubility. Many of the polysilane resists made could be developed in aqueous sodium carbonate and bicarbonate solutions. These materials represent environmentally friendly polysilane resists in both their synthesis and processing.
Date: December 31, 1995
Creator: Beach, J.V.; Loy, D.A.; Hsiao, Yu-Ling & Waymouth, R.M.
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