Description: Direct measurements of HF pressure in equilibrium with the film during the BaF2 process are sorely needed. It is the HF partial pressure that governs the rate at which the film composition is changing and is, therefore, an important factor in controlling the composition/time trajectory of the film. Establishing the composition/time trajectory of both MOD-derived and e-beam derived films for a given set of conditions is another goal for the project. These studies will provide a fundamental understanding of the ex situ process for producing coated conductors.
Date: November 1, 2006
Creator: Wesolowski, Dan
Item Type: Refine your search to only Report
Partner: UNT Libraries Government Documents Department