Development of a Whole-Wafer, Macroscale Inspection Software Method for Semiconductor Wafer Analysis
Description:
This report describes the non CRADA-protected results of the project performed between Nova Measuring Systems, Ltd., and the Oak Ridge National Laboratory to test and prototype defect signature analysis method for potential incorporation into an in-situ wafer inspection microscope. ORNL's role in this activity was to collaborate with Nova on the analysis and software side of the effort, wile Nova's role was to build the physical microscope and provide data to ORNL for test and evaluation. The o…
more
Date:
May 22, 2003
Creator:
Tobin, K.W.
Item Type:
Refine your search to only
Report
Partner:
UNT Libraries Government Documents Department