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Description: A photoelcctric comparator that can be used for making wavelength measurements, intensity measurements, and observations of the shapes of spectral lines is described. The instrument is similar to one reported by Tomkins and Fred with improvements in the optics. (auth)
Date: July 1, 1958
Creator: Steinhaus, D.W.
Partner: UNT Libraries Government Documents Department

Extreme ultraviolet lithography: A few more pieces of the puzzle

Description: The work described in this dissertation has improved three essential components of extreme ultraviolet (EUV) lithography: exposure tools, photoresist, and metrology. Exposure tools. A field-averaging illumination stage is presented that enables nonuniform, high-coherence sources to be used in applications where highly uniform illumination is required. In an EUV implementation, it is shown that the illuminator achieves a 6.5% peak-to-valley intensity variation across the entire design field of view. In addition, a design for a stand-alone EUV printing tool capable of delivering 15 nm half-pitch sinusoidal fringes with available sources, gratings and nano-positioning stages is presented. It is shown that the proposed design delivers a near zero line-edge-rougness (LER) aerial image, something extremely attractive for the application of resist testing. Photoresist. Two new methods of quantifying the deprotection blur of EUV photoresists are described and experimentally demonstrated. The deprotection blur, LER, and sensitivity parameters of several EUV photoresists are quantified simultaneously as base weight percent, photoacid generator (PAG) weight percent, and post-exposure bake (PEB) temperature are varied. Two surprising results are found: (1) changing base weight percent does not significantly affect the deprotection blur of EUV photoresist, and (2) increasing PAG weight percent can simultaneously reduce LER and E-size in EUV photoresist. The latter result motivates the development of an EUV exposure statistics model that includes the effects of photon shot noise, the PAG spatial distribution, and the changing of the PAG distribution during the exposure. In addition, a shot noise + deprotection blur model is used to show that as deprotection blur becomes large relative to the size of the printed feature, LER reduction from improved counting statistics becomes dominated by an increase in LER due to reduced deprotection contrast. Metrology. Finally, this dissertation describes MOSAIC, a new wavefront metrology that enables complete wavefront recovery from print or aerial image ...
Date: May 20, 2009
Creator: Anderson, Christopher N.
Partner: UNT Libraries Government Documents Department

Innovations in the design of mechanical components for a beamline -- The SRl`95 Workshop 2 summary

Description: The Synchrotron Radiation Instrumentation 1995 Conference (SRI`95) was hosted by the Advanced Photon Source (APS) at Argonne National Laboratory (ANL). Of the many workshops within the conference, the SRI`95 Workshop 2 was ``Innovations in the Design of Mechanical Components of a Beamline``. The workshop was attended well with over 140 registrants. The following topics were discussed. Industry`s perspective on the status and future was provided by Huber Diffrationtechnik, Oxford Instruments, and Kohzu Seiko Ltd. on goniometers/diffractometers, advanced manufacturing technique of high heat load components, such as the APS photon shutter, and the specialties of monochromators provided to the third-generation synchrotrons, respectively. This was followed by a description of the engineering of a dual function monochromator design for water-cooled diamond or cryogenically cooled silicon monochromators by CMC CAT/APS. Another category was the nagging problem of sensitivity of the photon beam position monitors (XBPM) to bending magnet radiation (``BM contamination``) and the undulator magnet gap changes. Problem descriptions and suggested solutions were provided by both the Advanced Light Source (ALS) and the APS. Other innovative ideas were the cooling schemes (enhanced cooling of beamline components using metallic porous meshes including cryo-cooled applications); Glidcop photon shutter design using microchannels at the ALS; and window/filter design, manufacture and operational experiences at CHESS and PETRA/HASYLAB. Additional discussions were held on designing for micromotions and precision in the optical support systems and smart user filter schemes. This is a summary of the presentations at the Workshop. 5 refs., 5 figs.
Date: December 31, 1995
Creator: Kuzay, T.M. & Warwick, T.
Partner: UNT Libraries Government Documents Department

Fabrication of Diffractive Optical Elements for an Integrated Compact Optical-MEMS Laser Scanner

Description: The authors describe the microfabrication of a multi-level diffractive optical element (DOE) onto a micro-electromechanical system (MEMS) as a key element in an integrated compact optical-MEMS laser scanner. The DOE is a four-level off-axis microlens fabricated onto a movable polysilicon shuttle. The microlens is patterned by electron beam lithography and etched by reactive ion beam etching. The DOE was fabricated on two generations of MEMS components. The first generation design uses a shuttle suspended on springs and displaced by a linear rack. The second generation design uses a shuttle guided by roller bearings and driven by a single reciprocating gear. Both the linear rack and the reciprocating gear are driven by a microengine assembly. The compact design is based on mounting the MEMS module and a vertical cavity surface emitting laser (VCSEL) onto a fused silica substrate that contains the rest of the optical system. The estimated scan range of the system is {+-}4{degree} with a spot size of 0.5 mm.
Date: July 13, 2000
Partner: UNT Libraries Government Documents Department

IC-Compatible Technologies for Optical MEMS

Description: Optical Micro Electro Mechanical Systems (Optical MEMS) Technology holds the promise of one-day producing highly integrated optical systems on a common, monolithic substrate. The choice of fabrication technology used to manufacture Optical MEMS will play a pivotal role in the size, functionality and ultimately the cost of optical Microsystems. By leveraging the technology base developed for silicon integrated circuits, large batches of routers, emitters, detectors and amplifiers will soon be fabricated for literally pennies per part. In this article we review the current status of technologies used for Optical MEMS, as well as fabrication technologies of the future, emphasizing manufacturable surface micromachining approaches to producing reliable, low-cost devices for optical communications applications.
Date: April 30, 1999
Creator: Krygowski, T.W. & Sniegowski, J.J.
Partner: UNT Libraries Government Documents Department

Alignment and commissionig of the APS beamline front ends

Description: Fifteen out of forty phase-one beamline front ends have been installed in the storage-ring tunnel at the 7-GeV Advanced Photon Source (APS). For the front-end installation, a four-step alignment process was designed and consists of (1) prealigning the front-end components with support tables in the preassembly area, (2) installing the components with tables in the storage-ring tunnel and aligning relative to the APS global telescope survey network, (3) confirming the alignment using a tooling laser alignment system, and (4) performing adjustments with the synchrotron-radiation beam during commissioning. The laser alignment system and the prealignment data- base have been of great importance for the expedient maintenance of front-end components. These tools are very important to a large synchrotron radiation facility such as the APS, since they make a quick alignment setup possible and minimize alignment time inside the tunnel. This paper will present the four-step alignment process, the laser alignment system, and discuss the alignment confirmation results. 6 refs., 5 figs.
Date: December 31, 1995
Creator: Shu, D.; barraza, J.; Ramanathan, M.; Chang, J. & Kuzay, T.M.
Partner: UNT Libraries Government Documents Department

Rapport Juin-Juillet 1999

Description: This report describes the optical system which allows the delivery, in an efficient and homogeneous way, of the pump light from the diode arrays of the Mercury laser system described in the two previous reports. I will, first, describe the present pumping line ; the description of the Advanced Pumping Design (APD) being given in the second part of this report.
Date: August 18, 1999
Creator: Bibeau, C & Chanteloupe, J C
Partner: UNT Libraries Government Documents Department

Bi-Stable Optical Actuator

Description: The present invention is a bi-stable optical actuator device that is depowered in both stable positions. A bearing is used to transfer motion and smoothly transition from one state to another. The optical actuator device may be maintained in a stable position either by gravity or a restraining device.
Date: October 15, 1999
Creator: Holdener, Fred R. & Boyd, Robert D.
Partner: UNT Libraries Government Documents Department

Small-Scale High-Performance Optics

Description: Historically, high resolution, high slew rate optics have been heavy, bulky, and expensive. Recent advances in MEMS (Micro Electro Mechanical Systems) technology and micro-machining may change this. Specifically, the advent of steerable sub-millimeter sized mirror arrays could provide the breakthrough technology for producing very small-scale high-performance optical systems. For example, an array of steerable MEMS mirrors could be the building blocks for a Fresnel mirror of controllable focal length and direction of view. When coupled with a convex parabolic mirror the steerable array could realize a micro-scale pan, tilt and zoom system that provides full CCD sensor resolution over the desired field of view with no moving parts (other than MEMS elements). This LDRD provided the first steps towards the goal of a new class of small-scale high-performance optics based on MEMS technology. A large-scale, proof of concept system was built to demonstrate the effectiveness of an optical configuration applicable to producing a small-scale (< 1cm) pan and tilt imaging system. This configuration consists of a color CCD imager with a narrow field of view lens, a steerable flat mirror, and a convex parabolic mirror. The steerable flat mirror directs the camera's narrow field of view to small areas of the convex mirror providing much higher pixel density in the region of interest than is possible with a full 360 deg. imaging system. Improved image correction (dewarping) software based on texture mapping images to geometric solids was developed. This approach takes advantage of modern graphics hardware and provides a great deal of flexibility for correcting images from various mirror shapes. An analytical evaluation of blur spot size and axi-symmetric reflector optimization were performed to address depth of focus issues that occurred in the proof of concept system. The resulting equations will provide the tools for developing future system designs.
Date: June 1, 2002
Partner: UNT Libraries Government Documents Department

BEAM TRANSPORT. A Selected, Annotated Bibliography

Description: References applicable to the problems of transponting charged particles in the areas external to accelerators are presented. The 891 references cover the period 1949 to 1981, with a few references both prior and subsequent to this period included. Part I is concerned with the more general aspects of electron optics. Part II contains the references that deal more directly with applications to particle accelerators. Arrangement within each pant is by broad subject with cross references listed at the end of each section. An author index is included. (M.C.G.)
Date: August 1, 1962
Creator: Kepple, R.R.
Partner: UNT Libraries Government Documents Department

A Concept for Zero-Alignment Micro Optical Systems

Description: We are developing a method of constructing compact, three-dimensional photonics systems consisting of optical elements, e.g., lenses and mirrors, photo-detectors, and light sources, e.g., VCSELS or circular-grating lasers. These optical components, both active and passive, are mounted on a lithographically prepared silicon substrate. We refer to the substrate as a micro-optical table (MOT) in analogy with the macroscopic version routinely used in optics laboratories. The MOT is a zero-alignment, microscopic optical-system concept. The position of each optical element relative to other optical elements on the MOT is determined in the layout of the MOT photomask. Each optical element fits into a slot etched in the silicon MOT. The slots are etched using a high-aspect-ratio silicon etching (HARSE) process. Additional positioning features in each slot's cross-section and complementary features on each optical element permit accurate placement of that element's aperture relative to the MOT substrate. In this paper we present the results of the first fabrication and micro-assembly experiments of a silicon-wafer based MOT. Based on these experiments, estimates of position accuracy are reported. We also report on progress in fabrication of lens elements in a hybrid sol-gel material (HSGM). Diffractive optical elements have been patterned in a 13-micron thick HSGM layer on a 150-micron thick soda-lime glass substrate. The measured ms surface roughness was 20 nm. Finally, we describe modeling of MOT systems using non-sequential ray tracing (NSRT).
Date: September 16, 1999
Partner: UNT Libraries Government Documents Department


Description: The recently completed 25-inch hydrogen bubble chamber combines excellent picture quality with a fast operating cycle. The chamber has a unique optical system and is designed to take several pictures each Bevatron pulse, in conjunction with the Bevatron rapid beam ejection system. At present the chamber operates twice per Bevatron pulse. The general features of the chamber constructiosn are shown in Figs. 1 and 2. The chamber is ten inches deep at the narrowest point. The magnet is of conventional water cooled design and in present operation produces a vertical field of 18.5 kgauss. With suitable generators it has produced a field of 22.8 kgauss. The most important new features are discussed below.
Date: July 8, 1964
Creator: Alvarez, Luis W.; Gow, J.D.; Barrera, Frank; Eckman, Glenn; Shand, Jim; Watt, R. et al.
Partner: UNT Libraries Government Documents Department


Description: Systematic error in the Long Trace Profiler (LTP) has become the major error source as measurement accuracy enters the nanoradian and nanometer regime. Great efforts have been made to reduce the systematic error at a number of synchrotron radiation laboratories around the world. Generally, the LTP reference beam has to be tilted away from the optical axis in order to avoid fringe overlap between the sample and reference beams. However, a tilted reference beam will result in considerable systematic error due to optical system imperfections, which is difficult to correct. Six methods of implementing a non-tilted reference beam in the LTP are introduced: (1) application of an external precision angle device to measure and remove slide pitch error without a reference beam, (2) independent slide pitch test by use of not tilted reference beam, (3) non-tilted reference test combined with tilted sample, (4) penta-prism scanning mode without a reference beam correction, (5) non-tilted reference using a second optical head, and (6) alternate switching of data acquisition between the sample and reference beams. With a non-tilted reference method, the measurement accuracy can be improved significantly. Some measurement results are presented. Systematic error in the sample beam arm is not addressed in this paper and should be treated separately.
Date: August 25, 2007
Creator: QIAN,S.; QIAN, K.; HONG, Y.; SENG, L.; HO, T. & TAKACS, P.
Partner: UNT Libraries Government Documents Department

Multilayer Phase-Only Diffraction Gratings: Fabrication andApplication to EUV Optics

Description: The use of phase-only diffractive devices has long played an important role in advanced optical systems in varying fields. Such devices include gratings, diffractive and holographic optical elements, diffractive lenses, and phase-shift masks for advanced lithography. Extending such devices to the increasingly important regime of extreme ultraviolet (EUV) wavelengths, however, is not trivial. Here, we present an effective fabrication and etch process enabling high-resolution patterning of Mo/Si multilayers for use in EUV phase devices, providing another method for fabrication of high numerical aperture diffractive devices or high-resolution EUV phase shift masks.
Date: May 1, 2007
Creator: Salmassi, Farhad; Gullikson, Eric M.; Anderson, Erik H. & Naulleau, Patrick P.
Partner: UNT Libraries Government Documents Department