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Electronic contribution to friction on GaAs

Description: The electronic contribution to friction at semiconductor surfaces was investigated by using a Pt-coated tip with 50nm radius in an atomic force microscope sliding against an n-type GaAs(100) substrate. The GaAs surface was covered by an approximately 1 nm thick oxide layer. Charge accumulation or depletion was induced by the application of forward or reverse bias voltages. We observed a substantial increase in friction force in accumulation (forward bias) with respect to depletion (reverse bias). We propose a model based on the force exerted by the trapped charges that quantitatively explains the experimental observations of excess friction.
Date: April 15, 2008
Creator: Applied Science and Technology Graduate Group, UC Berkeley; Dept. of Materials Sciences and Engineering, UC Berkeley; Salmeron, Miquel; Qi, Yabing; Park, J.Y.; Hendriksen, B.L.M. et al.
Partner: UNT Libraries Government Documents Department

A specially constructed metallograph for use at elevated temperatures

Description: "A metallographic microscope was developed with provision for heating a specimen to 1800 F in protective atmospheres, that is, vacuum or gas. A special objective was constructed of reflecting elements with an unusually long working distance (7/16 in.) and a high numerical aperture (0.5). Changes in specimen microstructure were observed and recorded on 35-millimeter motion-picture film. The resulting pictures were projected as motion pictures and individual frames were cut and enlargements made for close observation" (p. 1).
Date: September 11, 1951
Creator: Jenkins, Joe E.; Buchele, Donald R. & Long, Roger A.
Partner: UNT Libraries Government Documents Department

Thorough characterization of a EUV mask

Description: We reported that we were successful in our 45nm technology node device demonstration in February 2008 and 22nm node technology node device patterning in February 2009 using ASML's Alpha Demo Tool (ADT). In order to insert extreme ultraviolet (EUV) lithography at the 15nm technology node and beyond, we have thoroughly characterized one EUV mask, a so-called NOVACD mask. In this paper, we report on three topics, The first topic is an analysis of line edge roughness (LER) using a mask Scanning Electron Microscope (SEM), an Atomic Force Microscope (AFM) and the Actinic Inspection Tool (AIT) to compare resist images printed with the ASML ADT. The results of the analysis show a good correlation between the mask AFM and the mask SEM measurements, However, the resist printing results for the isolated space patterns are slightly different. The cause ofthis discrepancy may be resist blur, image log slope and SEM image quality and so on. The second topic is an analysis of mask topography using an AFM and relative reflectivity of mirror and absorber surface using the AIT, The AFM data show 6 and 7 angstrom rms roughness for mirror and absorber, respectively. The reflectivity measurements show that the mirror reflects EUV light about 20 times higher than absorber. The last topic is an analysis of a 32nm technology node SRAM cell which includes a comparison of mask SEM image, AIT image, resist image and simulation results. The ADT images of the SRAM pattern were of high quality even though the mask patters were not corrected for OPC or any EUV-specific effects. Image simulation results were in good agreement with the printing results.
Date: June 25, 2009
Creator: Mizuno, H.; McIntyre, G.; Koay, C.-W.; Burkhardt, M.; He, L.; Hartley, J. et al.
Partner: UNT Libraries Government Documents Department

Collecting EUV mask images through focus by wavelength tuning

Description: Using an extreme-ultraviolet (EUV) microscope to produce high-quality images of EUV reticles, we have developed a new wavelength tuning method to acquire through-focus data series with a higher level of stability and repeatability than was previously possible. We utilize the chromatic focal-length dependence of a diffractive Fresnel zoneplate objective lens, and while holding the mask sample mechanically still, we tune the wavelength through a narrow range, in small steps. In this paper, we demonstrate the method and discuss the relative advantages that this data collection technique affords.
Date: February 23, 2009
Creator: Goldberg, Kenneth A.; Mochi, Iacopo & Huh, Sungmin
Partner: UNT Libraries Government Documents Department

Using aberration test patterns to optimize the performance of EUV aerial imaging microscopes

Description: The SEMATECH Berkeley Actinic Inspection Tool (AIT) is a prototype EUV-wavelength zoneplate microscope that provides high quality aerial image measurements of EUV reticles. To simplify and improve the alignment procedure we have created and tested arrays of aberration-sensitive patterns on EUV reticles and we have compared their images collected with the AIT to the expected shapes obtained by simulating the theoretical wavefront of the system. We obtained a consistent measure of coma and astigmatism in the center of the field of view using two different patterns, revealing a misalignment condition in the optics.
Date: June 16, 2009
Creator: Mochi, Iacopo; Goldberg, Kenneth A.; Miyakawa, Ryan; Naulleau, Patrick; Han, Hak-Seung & Huh, Sungmin
Partner: UNT Libraries Government Documents Department

3D optical sectioning with a new hyperspectral confocal fluorescence imaging system.

Description: A novel hyperspectral fluorescence microscope for high-resolution 3D optical sectioning of cells and other structures has been designed, constructed, and used to investigate a number of different problems. We have significantly extended new multivariate curve resolution (MCR) data analysis methods to deconvolve the hyperspectral image data and to rapidly extract quantitative 3D concentration distribution maps of all emitting species. The imaging system has many advantages over current confocal imaging systems including simultaneous monitoring of numerous highly overlapped fluorophores, immunity to autofluorescence or impurity fluorescence, enhanced sensitivity, and dramatically improved accuracy, reliability, and dynamic range. Efficient data compression in the spectral dimension has allowed personal computers to perform quantitative analysis of hyperspectral images of large size without loss of image quality. We have also developed and tested software to perform analysis of time resolved hyperspectral images using trilinear multivariate analysis methods. The new imaging system is an enabling technology for numerous applications including (1) 3D composition mapping analysis of multicomponent processes occurring during host-pathogen interactions, (2) monitoring microfluidic processes, (3) imaging of molecular motors and (4) understanding photosynthetic processes in wild type and mutant Synechocystis cyanobacteria.
Date: February 1, 2007
Creator: Nieman, Linda T.; Sinclair, Michael B.; Davidson, George S.; Van Benthem, Mark Hilary; Haaland, David Michael; Timlin, Jerilyn Ann et al.
Partner: UNT Libraries Government Documents Department

Tools for Nanotechnology Education Development Program

Description: The overall focus of this project was the development of reusable, cost-effective educational modules for use with the table top scanning electron microscope (TTSEM). The goal of this project's outreach component was to increase students' exposure to the science and technology of nanoscience.
Date: September 27, 2010
Creator: Moore, Dorothy
Partner: UNT Libraries Government Documents Department

X-ray stereo microscopy for investigation of dynamics in soils

Description: The presented combination of stereo imaging and elemental mapping with soft X-ray microscopy reveals the spatial arrangement of naturally aqueous colloidal systems, e.g. iron oxides in soil colloid clusters. Changes in the spatial arrangement can be induced by manipulating the sample mounted to the X-ray microscope and thus be investigated directly.
Date: September 16, 2008
Creator: Gleber, S.-C.; Sedlmair, J.; Bertilson, M.; von Hofsten, O.; Heim, S.; Guttmann, P. et al.
Partner: UNT Libraries Government Documents Department

Scaling Behavior of the First Arrival Time of a Random-Walking Magnetic Domain

Description: We report a universal scaling behavior of the first arrival time of a traveling magnetic domain wall into a finite space-time observation window of a magneto-optical microscope enabling direct visualization of a Barkhausen avalanche in real time. The first arrival time of the traveling magnetic domain wall exhibits a nontrivial fluctuation and its statistical distribution is described by universal power-law scaling with scaling exponents of 1.34 {+-} 0.07 for CoCr and CoCrPt films, despite their quite different domain evolution patterns. Numerical simulation of the first arrival time with an assumption that the magnetic domain wall traveled as a random walker well matches our experimentally observed scaling behavior, providing an experimental support for the random-walking model of traveling magnetic domain walls.
Date: February 4, 2008
Creator: Im, M.-Y.; Lee, S.-H.; Kim, D.-H.; Fischer, P. & Shin, S.-C.
Partner: UNT Libraries Government Documents Department

Friction Anisotropy: A unique and intrinsic property of decagonal quasicrystals

Description: We show that friction anisotropy is an intrinsic property of the atomic structure of Al-Ni-Co decagonal quasicrystals and not only of clean and well-ordered surfaces that can be prepared in vacuum [J.Y. Park et al., Science (2005)]. Friction anisotropy is manifested both in nanometer size contacts obtained with sharp atomic force microscope (AFM) tips as well as in macroscopic contacts produced in pin-on-disc tribometers. We show that the friction anisotropy, which is not observed when an amorphous oxide film covers the surface, is recovered when the film is removed due to wear. Equally important is the loss of the friction anisotropy when the quasicrystalline order is destroyed due to cumulative wear. These results reveal the intimate connection between the mechanical properties of these materials and their peculiar atomic structure.
Date: June 25, 2008
Creator: Mulleregan, Alice; Park, Jeong Young; Salmeron, Miquel; Ogetree, D.F.; Jenks, C.J.; Thiel, P.A. et al.
Partner: UNT Libraries Government Documents Department

Acid-Base Interactions at the Molecular Level: Adhesion and Friction Studies with Interfacial Force Microscopy

Description: To examine the forces of acid-base adhesive interactions at the molecular level, we utilize the scanning probe Interracial Force Microscope (IFM). Unlike cantilever-based atomic force microscopes, the EM is a non-compliant, mechanically stable probe that provides a complete adhesive profile without jump-to-contact. In this way, we are able to quantitatively measure the work of adhesion and bond energies at well-defined, nanometer-scale single asperity contacts. In particular, we will discuss the displacement-controlled adhesive forces between self-assembled monolayer of functionalized alkanethiols strongly bound to a gold substrate and a similarly functionalized tip. We also discuss a method utilizing decoupled lateral and normal force sensors to simultaneously observe the onset of both friction and chemical bond formation. Measurements show that friction can be directly attributed to bond formation and rupture well before repulsive contact.
Date: December 9, 1998
Creator: Burns, A.R.; Carpick, R.W.; Houston, J.E. & Michalske, T.A.
Partner: UNT Libraries Government Documents Department

Comment on "Modification of graphene properties due to electron-beam irradiation"

Description: This article gives comment to a previous article entitled 'Modification of graphene properties due to electron-beam irradiation'. These articles discuss the modification of graphene properties due to electron-beam irradiation.
Date: December 17, 2009
Creator: Jones, Jason D.; Ecton, Philip A.; Mo, Yudong & Pérez, José M.
Partner: UNT College of Arts and Sciences

Fastest Electropolishing Technique on Niobium for Particle Accelerators

Description: Field emission on the inner surfaces of niobium (Nb) superconducting radio frequency (SRF) cavities is still one of the major obstacles for reaching high accelerating gradients for SRF community. Our previous experimental results [1] seemed to imply that the threshold of field emission was related to the thickness of Nb surface oxide layers. In this contribution, a more detailed study on the influences of the surface oxide layers on the field emission on Nb surfaces will be reported. By anodization technique, the thickness of the surface pentoxide layer was artificially fabricated from 3nm up to 460nm. A home-made scanning field emission microscope (SFEM) was employed to perform the scans on the surfaces. Emitters were characterized using a scanning electron microscope together with an energy dispersive x-ray analyzer. The experimental results could be understood by a simple model calculation based on classic electromagnetic theory as shown in Ref.1. Possibly implications for Nb SRF cavity applications from this study will be discussed.
Date: September 1, 2011
Creator: A.T. Wu, S. Jin, R.A. Rimmer, X.Y. Lu, K. Zhao
Partner: UNT Libraries Government Documents Department

Evaluating EUV mask pattern imaging with two EUV microscopes

Description: Aerial image measurement plays a key role in the development of patterned reticles for each generation of lithography. Studying the field transmitted (reflected) from EUV masks provides detailed information about potential disruptions caused by mask defects, and the performance of defect repair strategies, without the complications of photoresist imaging. Furthermore, by measuring the continuously varying intensity distribution instead of a thresholded, binary resist image, aerial image measurement can be used as feedback to improve mask and lithography system modeling methods. Interest in EUV, at-wavelength, aerial image measurement lead to the creation of several research tools worldwide. These tools are used in advanced mask development work, and in the evaluation of the need for commercial at-wavelength inspection tools. They describe performance measurements of two such tools, inspecting the same EUV mask in a series of benchmarking tests that includes brightfield and darkfield patterns. One tool is the SEMATECH Berkeley Actinic Inspection Tool (AIT) operating on a bending magnet beamline at Lawrence Berkeley National Laboratory's Advanced Light Source. The AIT features an EUV Fresnel zoneplate microscope that emulates the numerical aperture of a 0.25-NA stepper, and projects the aerial image directly onto a CCD camera, with 700x magnification. The second tool is an EUV microscope (EUVM) operating at the NewSUBARU synchrotron in Hyogo, Japan. The NewSUBARU tool projects the aerial image using a reflective, 30x Schwarzschild objective lens, followed by a 10-200x x-ray zooming tube. The illumination conditions and the imaging etendue are different for the two tools. The benchmarking measurements were used to determine many imaging and performance properties of the tools, including resolution, modulation transfer function (MTF), aberration magnitude, aberration field-dependence (including focal-plane tilt), illumination uniformity, line-edge roughness, and flare. These measurements reveal the current state of the art in at-wavelength inspection performance, and will be a useful reference as ...
Date: February 26, 2008
Creator: Goldberg, Kenneth A.; Takase, Kei; Naulleau, Patrick P.; Han, Hakseung; Barty, Anton; Kinoshita, Hiroo et al.
Partner: UNT Libraries Government Documents Department

In-Situ TEM Study of Interface Sliding and Migration in an Ultrafine Lamellar Structure

Description: The instability of interfaces in an ultrafine TiAl-({gamma})/Ti{sub 3}Al-({alpha}{sub 2}) lamellar structure by straining at room temperature has been investigated using in-situ straining techniques performed in a transmission electron microscope. The purpose of this study is to obtain experimental evidence to support the creep mechanisms based upon the interface sliding in association with a cooperative movement of interfacial dislocations previously proposed to interpret the nearly linear creep behavior observed from ultrafine lamellar TiAl alloys. The results have revealed that both the sliding and migration of lamellar interfaces can take place simultaneously as a result of the cooperative movement of interfacial dislocations.
Date: December 6, 2005
Creator: Hsiung, L M
Partner: UNT Libraries Government Documents Department

High Frequency Laser-Based Ultrasound

Description: To obtain micrometer resolution of materials using acoustics requires frequencies around 1 GHz. Attenuation of such frequencies is high, limiting the thickness of the parts that can be characterized. Although acoustic microscopes can operate up to several GHz in frequency, they are used primarily as a surface characterization tool. The use of a pulsed laser for acoustic generation allows generation directly in the part, eliminating the loss of energy associated with coupling the energy from a piezoelectric transducer to the part of interest. The use of pulsed laser acoustic generation in combination with optical detection is investigated for the non-contact characterization of materials with features that must be characterized to micrometer resolution.
Date: September 12, 2005
Creator: Huber, R; Chinn, D; Balogun, O & Murray, T
Partner: UNT Libraries Government Documents Department

Pu Workshop Letter

Description: In preparation for the upcoming Pu Workshop in Livermore, CA, USA, during July 14 and 15, 2006, we have begun to give some thought as to how the meeting will be structured and what will be discussed. Below, you will find our first proposal as to the agenda and contents of the meeting. From you, we need your feedback and suggestions concerning the desirability of each aspect of our proposal. Hopefully, we will be able to converge to a format that is acceptable to all parties. First, it now appears that we will be limited to three main sessions, Friday morning (July 14), Friday afternoon (July 14) and Saturday morning (July 15). The Pu Futures Meeting will conclude on Thursday, July 13. Following a social excursion, the Russian participants will be transported from Monterey Bay to their hotel in Livermore. We anticipate that the hotel will be the Residence Inn at 1000 Airway Blvd in Livermore. However, the hotel arrangements still need to be confirmed. We expect that many of our participants will begin their travels homeward in the afternoon of Saturday, July 15 and the morning of Sunday, July 16. Associated with the three main sessions, we propose that there be three main topics. Each session will have an individual focus. Because of the limited time available, we will need to make some judicious choices concerning the focus and the speakers for each session. We will also have a poster session associated with each session, to facilitate discussions, and a rotating set of Lab Tours, to maximize participation in the tour and minimize the disruption of the speaking schedule. Presently, we are planning a tour of the Dynamical Transmission Electron Microscope (DTEM) facilities, but this is still in a preliminary stage. We estimate that for each session and topic, ...
Date: March 6, 2006
Creator: Tobin, J G; Schwartz, A J & Fluss, M
Partner: UNT Libraries Government Documents Department

Development of a Whole-Wafer, Macroscale Inspection Software Method for Semiconductor Wafer Analysis

Description: This report describes the non CRADA-protected results of the project performed between Nova Measuring Systems, Ltd., and the Oak Ridge National Laboratory to test and prototype defect signature analysis method for potential incorporation into an in-situ wafer inspection microscope. ORNL's role in this activity was to collaborate with Nova on the analysis and software side of the effort, wile Nova's role was to build the physical microscope and provide data to ORNL for test and evaluation. The objective of this project was to adapt and integrate ORNL's SSA and ADC methods and technologies in the Nova imaging environment. ORNL accomplished this objective by modifying the existing SSA technology for use as a wide-area signature analyzer/classifier on the Nova macro inspection tool (whole-wafer analysis). During this effort ORNL also developed a strategy and methodology for integrating and presenting the results of SSA/ADC analysis to the tool operator and/or data management system (DMS) used by the semiconductor manufacturer (i.e., the end-user).
Date: May 22, 2003
Creator: Tobin, K.W.
Partner: UNT Libraries Government Documents Department


Description: Beam-induced specimen movement may be the major factor that limits the quality of high-resolution images of organic specimens. One of the possible measures to improve the situation that was proposed by Henderson and Glaeser (Henderson and Glaeser, 1985), which we refer to here as 'stroboscopic image capture', is to divide the normal exposure into many successive frames, thus reducing the amount of electron exposure--and possibly the amount of beam-induced movement--per frame. The frames would then be aligned and summed. We have performed preliminary experiments on stroboscopic imaging using a 200-kV electron microscope that was equipped with a high dynamic range CCD camera for image recording and a liquid N{sub 2}-cooled cryoholder. Single-layer paraffin crystals on carbon film were used as a test specimen. The ratio F(g)/F(0) of paraffin reflections, calculated from the images, serves as our criterion for the image quality. In the series that were evaluated, no significant improvement of the F{sub image}(g)/F{sub image}(0) ratio was found, even though the electron exposure per frame was reduced by a factor of 30. A frame-to-frame analysis of image distortions showed that considerable beam-induced movement had still occurred during each frame. In addition, the paraffin crystal lattice was observed to move relative to the supporting carbon film, a fact that cannot be explained as being an electron-optical effect caused by specimen charging. We conclude that a significant further reduction of the dose per frame (than was possible with this CCD detector) will be needed in order to test whether the frame-to-frame changes ultimately become small enough for stroboscopic image capture to show its potential.
Date: August 1, 2006
Creator: Typke, Dieter; Gilpin, Christopher J.; Downing, Kenneth H. & Glaeser, Robert M.
Partner: UNT Libraries Government Documents Department

Single-spin microscope with sub-nanoscale resolution based on optically detected magnetic resonance

Description: Invention of scanning tunneling microscope (STM) and atomic force microscope (AFM) initiated a new era of material science and technology characterized by 2-D imaging with atomic resolution and manipulation of individual atoms. However, for further progress in material science, and in particular in structural biology, 3-D imaging with sub-nanometer resolution is very desirable. Currently the most promising technique for 3-D imaging is magnetic resonance force microscopy (MRFM), which senses individual electron spins [1,2] with nanoscale resolution and can detect collective magnetization of about 100 nuclear spins [3]. The highest sensitivity demonstrated by MRFM is based on a time modulation technique called the oscillating cantilever-driven adiabatic reversals (OSCAAR) which requires a long phase relaxation time T 2 of measured spins, which usually corresponds to rather low temperature. For example, a temperature of 300 mK was used in the case of 3D imaging of the tobacco mosaic virus [3]. This limitation is incompatible with the room-temperature operation needed for the study of biological systems under physiological conditions.
Date: January 1, 2009
Creator: Berman, Gennady P & Chernobrod, Boris
Partner: UNT Libraries Government Documents Department

Wave-Based Inversion & Imaging for the Optical Quadrature Microscope

Description: The Center for Subsurface Sensing & Imaging System's (CenSSIS) Optical Quadrature Microscope (OQM) is a narrow band visible light microscope capable of measuring both amplitude and phase of a scattered field. We develop a diffraction tomography, that is, wave-based, scattered field inversion and imaging algorithm, for reconstructing the refractive index of the scattering object.
Date: October 27, 2005
Creator: Lehman, S K
Partner: UNT Libraries Government Documents Department