Wafer Fabrication Monitoring/Control System and Method
Description:
Patent relating to systems and methods for monitoring and testing patterning processes including etching, cleaning, and depositing of low k and ultra-low k dielectrics for semiconductor technologies.
Date:
June 14, 2016
Creator:
Chen, Jin-Jian & Chyan, Oliver M. R.
Item Type:
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Patent
Partner:
UNT College of Arts and Sciences