Field emission from carbon films deposited by VHF CVD on difference substrates
Description:
As previously demonstrated, non-diamond carbon (NDC) films deposited at low temperatures 200-300 C on silicon tips reduced the threshold of field emission. In this paper we will present the results of the study of field emission from flat NDC films prepared by VHF CVD. Emission measurements were performed in a diode configuration at approximately 10{sup {minus}10} Torr. NDC films were deposited on ceramic and on c-Si substrates sputter coated with layers of Ti, Cu, Ni and Pt. The back contact m…
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Date:
April 1, 1999
Creator:
Abramov, A A; Andronov, A N; Felter, T E; Ioffe, A F; Kosarev, A I; Shotov, M V et al.
Item Type:
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