Description: A technique is described for the preparation of beryllium foils by vapor deposition. The high-purity, pinhole-free foils are vacuum tight and suitable for many x-ray analysis applications. The beryllium is evaporated from an electron beam heated crucible source onto a heated substrated. Substrate temperatures of 450 to 700/sup 0/C are necessary to obtain the desired mechanical properties of the foils. At these temperatures, contamination of the foils by diffusion of the substrate material into the beryllium can be a significant problem, as impurity levels of more than several hundred ppM are detrimental to the x-ray transparency of the windows. This problem is minimized by careful selection and preparation of the substrate. A clean deposition system and pure source material are necessary to preserve elemental integrity of the vapor-deposited foils.
Date: January 1, 1980
Creator: Taylor, R.D.
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