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FY06 LDRD Final Report Next-generation x-ray optics: focusing hard x-rays

Description: The original goal of our research was to open up a new class of scientific experiments by increasing the power of newly available x-ray sources by orders of magnitude. This was accomplished by developing a new generation of x-ray optics, based on hard x-ray (10-200 keV) reflective and diffractive focusing elements. The optical systems we envision begin with a core reflective optic, which has the ability to capture and concentrate x-rays across a wide range of energies and angles band, combined … more
Date: March 1, 2007
Creator: Pivovaroff, M & Soufli, R
Item Type: Refine your search to only Report
Partner: UNT Libraries Government Documents Department
open access

LCLS X-ray mirror measurements using a large aperture visible light interferometer

Description: Synchrotron or FEL X-ray mirrors are required to deliver an X-ray beam from its source to an experiment location, without contributing significantly to wave front distortion. Accurate mirror figure measurements are required prior to installation to meet this intent. This paper describes how a 300 mm aperture phasing interferometer was calibrated to <1 nm absolute accuracy and used to mount and measure 450 mm long flats for the Linear Coherent Light Source (LCLS) at Stanford Linear Accelerato… more
Date: March 2, 2011
Creator: McCarville, T; Soufli, R & Pivovaroff, M
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
open access

Atomic Force Microscope (AFM) measurements and analysis on Sagem 05R0025 secondary substrate

Description: The summary of Atomic Force Microscope (AFM) on Sagem 05R0025 secondary substrate: (1) 2 x 2 {micro}m{sup 2} and 10 x 10 {micro}m{sup 2} AFM measurements and analysis on Sagem 05R0025 secondary substrate at LLNL indicate rather uniform and extremely isotropic finish across the surface, with high-spatial frequency roughness {sigma} in the range 5.1-5.5 {angstrom} rms; (2) the marked absence of pronounced long-range polishing marks in any direction, combined with increased roughness in the very h… more
Date: February 22, 2006
Creator: Soufli, R; Baker, S L & Robinson, J C
Item Type: Refine your search to only Report
Partner: UNT Libraries Government Documents Department
open access

Corrosion-resistant multilayer coatings for the 28-75 nm wavelength region

Description: Corrosion has prevented use of SiC/Mg multilayers in applications requiring good lifetime stability. We have developed Al-based barrier layers that dramatically reduce corrosion, while preserving high reflectance and low stress. The aforementioned advances may enable the implementation of corrosion-resistant, high-performance SiC/Mg coatings in the 28-75 nm region in applications such as tabletop EUV/soft x-ray laser sources and solar physics telescopes. Further study and optimization of corros… more
Date: November 8, 2011
Creator: Soufli, R.; Fernandez-Perea, Monica & Al, E. T.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
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Zirconium and Niobium Transmission Data at Wavelengths from 11-16 nm and 200-1200 nm

Description: Transmission measurements of niobium and zirconium at both extreme-ultraviolet (EUV) and ultraviolet, visible, and near infrared (UV/Vis/NIR) wavelengths are presented. Thin foils of various thicknesses mounted on nickel mesh substrates were measured, and these data were used to calculate the optical constants {delta} and {beta} of the complex refractive index n = 1- {delta} +i{beta}. {beta} values were calculated directly from the measured transmittance of the foils after normalizing for the n… more
Date: August 30, 2004
Creator: Johnson, T; Soufli, R; Gulikson, E & Clift, M
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
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Optics and multilayer coatings for EUVL systems

Description: EUV lithography (EUVL) employs illumination wavelengths around 13.5 nm, and in many aspects it is considered an extension of optical lithography, which is used for the high-volume manufacturing (HVM) of today's microprocessors. The EUV wavelength of illumination dictates the use of reflective optical elements (mirrors) as opposed to the refractive lenses used in conventional lithographic systems. Thus, EUVL tools are based on all-reflective concepts: they use multilayer (ML) coated optics for t… more
Date: March 21, 2008
Creator: Soufli, R.; Bajt, S.; Hudyma, R. M. & Taylor, J. S.
Item Type: Refine your search to only Book
Partner: UNT Libraries Government Documents Department
open access

An assesment of yttrium optical constants in the EUV using Mo/Y multilayers designed as linear polarizers

Description: We have produced and characterized Mo/Y multilayers designed as linear-polarizers for use near {lambda} {approx} 8 nm. By depositing these films directly onto silicon photodiodes, we are able to measure both reflectance and transmittance in the EUV using synchrotron radiation. These measurements have been used to access the accuracy of yttrium optical constants in this wavelength range. We describe our experimental results and discuss the prospects for the future development of efficient EUV po… more
Date: September 13, 2004
Creator: Kjornrattanawanich, B; Soufli, R; Bajt, S; Windt, D L & Seely, J F
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
open access

Optical Constants of Beryllium from Photoabsorption Measurements for X-Ray Optics Applications

Description: Beryllium (Be) has been recently receiving considerable attention as the key material for a range of potential applications in the extreme ultraviolet (EUV) and x-ray region. Most notably, it has been successfully implemented as the spacer material in beryllium-based multilayer mirrors for EUV lithography, achieving experimental reflectivities of about 70% at wavelengths around 11.4 nm. Knowledge of the absorptive and dispersive properties of this material thus becomes important for the modelin… more
Date: September 30, 1999
Creator: Soufli, R.; Bajt, S. & Gullikson, E.M.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
open access

EUV reflectance characterization of the 94/304 ? flight secondary AIA mirror at beamline 6.3.2 of the Advanced Light Source

Description: The AIA secondary flight mirror, previously coated at Columbia University with Mg/SiC for the 303.8 {angstrom} channel and Mo/Y for the 93.9 {angstrom} channel was characterized by means of EUV reflectance measurements at beamline 6.3.2 of the Advanced Light Source (ALS) synchrotron at LBNL on January 10, 2006. Paul Boerner (LMSAL) also participated in these measurements.
Date: February 22, 2006
Creator: Soufli, R; Spiller, E; Aquila, A. L.; Gullikson, E. M. & Windt, D. L.
Item Type: Refine your search to only Report
Partner: UNT Libraries Government Documents Department
open access

Probing the eV-Mass Range for Solar Axions with CAST

Description: The CERN Axion Solar Telescope (CAST) is searching for solar axions which could be produced in the core of the Sun via the so-called Primakoff effect. Not only would these hypothetical particles solve the strong CP problem, but they are also one of the favored candidates for dark matter. In order to look for axions originating from the Sun, CAST uses a decommissioned LHC prototype magnet. In its 10 m long magnetic field region of 9 Tesla, axions could be reconverted into X-ray photons. Differen… more
Date: November 11, 2010
Creator: Vogel, J K; Pivovaroff, M J; Soufli, R; van Bibber, K & CAST, C
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
open access

Optical constants of materials in the EUV/soft x-ray region for multilayer mirror applications

Description: The response of a given material to an incident electromagnetic wave is described by the energy dependent complex index of refraction n = 1 {minus} {delta} + i{beta}. In the extreme ultraviolet (EUV)/soft x-ray spectral region, the need for accurate determination of n is driven by activity in areas such as synchrotron based research, EUV/x-ray lithography, x-ray astronomy and plasma applications. Knowledge of the refractive index is essential for the design of the optical components of instrume… more
Date: December 1, 1997
Creator: Soufli, R.
Item Type: Refine your search to only Thesis or Dissertation
Partner: UNT Libraries Government Documents Department
open access

Soft X-ray Mirrors for the Linac Coherent Light Source

Description: The Linac Coherent Light Source (LCLS) is a 0.15-1.5 nm wavelength free-electron laser (FEL) being constructed at the Stanford Linear Accelerator Center (SLAC) by a multi-institution consortium, including Lawrence Livermore National Laboratory (LLNL). One of LLNL's responsibilities involves the design and construction of two grazing-incidence mirror systems whose primary intent is to reduce radiation levels in the experimental halls by separating the FEL beam from unwanted high-energy photons. … more
Date: August 13, 2007
Creator: Pivovaroff, M. J.; Bionta, R. M.; Mccarville, T. J.; Soufli, R. & Stefan, P. M.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
open access

Multilayer deposition and EUV reflectance characterization of 131 ? flight mirrors for AIA at LLNL

Description: Mo/Si multilayer coatings reflecting at 131 {angstrom} were deposited successfully on the AIA primary and secondary flight mirrors and on two coating witness Si wafers, on November 16, 2005, at LLNL. All coatings were characterized by means of EUV reflectance measurements at beamline 6.3.2 of the Advanced Light Source (ALS) synchrotron at LBNL, and were found to be well within specifications.
Date: February 22, 2006
Creator: Soufli, R; Robinson, J C; Spiller, E; Baker, S L; Dollar, F J & Gullikson, E M
Item Type: Refine your search to only Report
Partner: UNT Libraries Government Documents Department
open access

Beryllium based multilayers for normal incidence extreme ultraviolet reflectance

Description: We report the experimental results of beryllium based multilayer mirrors for use in the 11.4 nm region. Mirrors using molybdenum as the high-Z material have demonstrated 68.7% peak reflectance at 11.3 nm.
Date: November 1, 1994
Creator: Skulina, K.; Alford, C.; Bionta, R.; Makowiecki, D.; Gullikson, E.; Soufli, R. et al.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
open access

Beryllium based multilayers for normal incidence extreme ultraviolet reflectivity

Description: The need for normal incidence mirrors maintaining reflectivity greater than 60% for an industrially competitive Extreme Ultraviolet Lithography (EUV) system has been well documented. The Molybdenum/Silicon system has emerged as the de-facto standard, where researchers are now routinely fabricating mirrors demonstrating 63% reflectivity near 130 Angstroms. However, multilayer mirrors using beryllium as the low atomic number (low-Z) spacer could potentially show similar or better reflectivity, an… more
Date: May 26, 1994
Creator: Skulina, K. M.; Alford, C.; Bionta, R. M.; Makowiecki, D. M.; Kortright, J.; Soufli, R. et al.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
open access

Smoothing of Diamond-Turned Substrates for Extreme Ultraviolet Illuminators

Description: Condenser optics in extreme ultraviolet lithography (EUVL) systems are subjected to frequent replacement as they are positioned close to the illumination source, where increased heating and contamination occur. In the case of aspherical condenser elements made by optical figuring/finishing, their replacement can be very expensive (several hundred thousand dollars). One approach to this problem would be to manufacture inexpensive illuminator optics that meet all required specifications and could… more
Date: November 13, 2003
Creator: Soufli, R; Spiller, E; Schmidt, M A; Robinson, J C; Baker, S L; Ratti, S et al.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
open access

Sub-diffraction-limited multilayer coatings for the 0.3-NA Micro-Exposure Tool for extreme ultraviolet lithography

Description: This manuscript discusses the multilayer coating results for the primary and secondary mirrors of the Micro Exposure Tool (MET): a 0.30-numerical aperture (NA) lithographic imaging system with 200 x 600 {micro}m{sup 2} field of view at the wafer plane, operating in the extreme ultraviolet (EUV) wavelength region. Mo/Si multilayers were deposited by DC-magnetron sputtering on large-area, curved MET camera substrates, and a velocity modulation technique was implemented to consistently achieve mul… more
Date: January 3, 2007
Creator: Soufli, R.; Hudyma, R. M.; Spiller, E.; Gullikson, E. M.; Schmidt, M. A.; Robinson, J. C. et al.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
open access

EUV multilayer coatings for the Atmospheric Imaging Assembly instrument aboard the Solar Dynamics Observatory

Description: Multilayer coatings for the 7 EUV channels of the AIA have been developed and completed successfully on all AIA flight mirrors. Mo/Si coatings (131, 171, 193.5, 211 {angstrom}) were deposited at Lawrence Livermore National Laboratory (LLNL). Mg/SiC (304, 335 {angstrom}) and Mo/Y (94 {angstrom}) coatings were deposited at Columbia University. EUV reflectance of the 131/335 {angstrom}, 171 {angstrom}, 193.5/211 {angstrom} primary and secondary flight mirrors and the 94/304 {angstrom} secondary fl… more
Date: February 9, 2006
Creator: Soufli, R.; Windt, D. L.; Robinson, J. C.; Baker, S. L.; Spiller, E.; Dollar, F. J. et al.
Item Type: Refine your search to only Article
Partner: UNT Libraries Government Documents Department
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