Characterization of electrical linewidth test structures patterned in (100) Silicon-on-Insulator for use as CD standards
Description:
This paper describes the fabrication and measurement of the linewidths of the reference segments of cross-bridge resistors patterned in (100) Bonded and Etched Back Silicon-on-Insulator (BESOI) material. The critical dimensions (CD) of the reference segments of a selection of the cross-bridge resistor test structures were measured both electrically and by Scanning-Electron Microscopy (SEM) cross-section imaging. The reference-segment features were aligned with <110> directions in the BESO…
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Date:
February 29, 2000
Creator:
Cresswell, M. W.; Allen, R. A.; Ghoshtagore, R. N.; Guillaume, N. M. P.; Shea, Patrick J.; Everist, Sarah C. et al.
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