Description: Sputtering yields of various wall/limiter materials of fusion devices have been extensively measured in the relevant plasma environment for low-energy light ions (E < 300eV). As a plasma source we have used an energetic arc device (QED-1 machine) in which hydrogen, deuterium, helium and argon plasma can be generated with a density of up to 10/sup 14/ cm/sup -3/ and electron temperature up to 10eV. Target materials used were C (graphite), Ti, Mo, Ta, W, and Fe (stainless steel). In order to study the dependence of the sputtering yields on the incident energy of ions, the target samples were held at negative bias voltage up to 300V. The sputtering yields were determined by a weight-loss method and by spectral line intensity measurements. The data obtained in the present experiment agree well with those previously obtained at the higher energies (E greater than or equal to 200eV) by other authors using different schemes; the present data also extend to substantially lower energies (E approx. > 30eV) than hitherto.
Date: April 1, 1979
Creator: Nishi, M.; Yamada, M.; Suckewer, S. & Rosengaus, E.
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