9 Matching Results

Search Results

Advanced search parameters have been applied.

in creator/contributor: "Mancini, D. C."

open access

X-ray lenses fabricated by deep x-ray lithography.

Refractive x-ray lenses have been fabricated using deep x-ray lithography. Lenses were produced directly in 1- to 6-mm-thick sheets of polymethylmethacrylate (PMMA) with as many as 100 cylindrical lenses along the optical axis. The fabrication process consists of exposing the PMMA sheets to high-energy synchrotron radiation through a mask of 50-micron-thick gold on silicon and subsequent development in ketone. The lenses are suitable for use in synchrotron radiation from a bending magnet at the… more

Date: September 26, 2002

Creator: Mancini, D. C.; Moldovan, N.; Divan, R.; DeCarlo, F. & Yaeger, J.

Item Type: Article

Partner: UNT Libraries Government Documents Department

open access

Thermal management of masks for deep x-ray lithography.

This paper addresses some options and techniques in the thermal management of masks used in deep x-ray lithography. The x-ray masks are thin plates made of low-atomic-number materials on which a patterned thin film of a high-atomic-number metal has been deposited. When they are exposed to an x-ray beam, part of the radiation is transmitted to replicate the pattern on a downstream photoresist, and the remainder is absorbed in the mask in the form of heat. This heat load can cause deformation of … more

Date: November 18, 1997

Creator: Khounsary, A.; Chojnowski, D.; Mancini, D.C.; Lai, B. & Dejus, R.

Item Type: Article

Partner: UNT Libraries Government Documents Department

open access

Beamline and exposure station for deep x-ray lithography at the Advanced Photon Source

APS is a third-generation synchrotron radiation source. With an x-ray energy of 19.5 keV and highly collimated beam (<0.1 mrad), APS is well suited for producing high-aspect-ratio microstructures in thick resist films (> 1 mm) using deep x-ray lithography (DXRL). The 2-BM beamline was constructed and will be used for DXRL at APS. Selection of appropriate x-ray energy range is done through a variable-angle mirror and various filters in the beamline. At the exposure station, the beam size will be… more

Date: December 31, 1996

Creator: Lai, B.; Mancini, D.C.; Yun, W. & Gluskin, E.

Item Type: Article

Partner: UNT Libraries Government Documents Department

open access

Progress in the fabrication of high aspect ratio zone plates by soft x-ray lithography.

Soft x-ray lithography technology has been applied to fabrication of phase shifting Fresnel Zone Plate (FZP's) for hard x-rays. Effects of the exposure conditions, developing system, and electroplating process parameters on line width and aspect ratio have been analyzed. The process has been optimized and an aspect ratio of 11 has been achieved for 110 nm outermost zone width. SEM and AFM have been used for preliminary metrology of the FZPs. The FZP optical performance was characterized at 8 ke… more

Date: August 13, 2002

Creator: Divan, R.; Mancini, D. C.; Moldovan, N. A.; Lai, B.; Assoufid, L.; Leondard, Q. et al.

Item Type: Article

Partner: UNT Libraries Government Documents Department

open access

Microfabrication of freestanding metal structures released from graphite substrates.

A sacrificial layer is usually used to release electroformed microstructures. Because of the chemistry applied to the sacrificial layer, only a limited number of metals can be used for electroforming. A novel method to fabricate freestanding electroformed copper structures is presented. A graphite substrate allows the release of the metal part, by abrasive removal of the graphite after electroforming. Results on fabrication of high-aspect-ratio freestanding copper grids are presented; these can… more

Date: February 22, 2002

Creator: Makarova, O. V.; Tang, C.-M.; Mancini, D. C.; Moldovan, N.; Divan, R.; Ryding, D. G. et al.

Item Type: Article

Partner: UNT Libraries Government Documents Department

open access

MM-Wave Cavity/Klystron Developments Using Deep X-Ray Lithography at the Advanced Photon Source

Recent microfabrication technologies based on LIGA (German acronym for Lithographe, Galvanoformung, und Abformung) have been applied to build high-aspect-ratio, metallic or dielectric, planar structures suitable for high-frequency rf cavity structures. The cavity structures would be used as parts of linear accelerators, microwave undulators, and mm-wave amplifiers. The microfabrication process includes manufacturing of precision x-ray masks, exposure of positive resist by x-rays through the mas… more

Date: October 25, 2006

Creator: Song, J. J.; Kang, Y. W.; Kustom, R. L.; Mancini, D. C.; Nassiri, A.; Lai, B. et al.

Item Type: Article

Partner: UNT Libraries Government Documents Department

open access

LIGA-fabricated compact mm-wave linear accelerator cavities.

Millimeter-wave rf cavities for use in linear accelerators, free-electron lasers, and mm-wave undulatory are under development at Argonne National Laboratory. Typical cavity dimensions are in the 1000 mm range, and the overall length of the accelerator structure, which consists of 30-100 cavities, is about 50-100 mm. An accuracy of 0.2% in the cavity dimensions is necessary in order to achieve a high Q-factor of the cavity. To achieve this these structures are being fabricated using deep X-ray … more

Date: March 23, 1998

Creator: Song, J.J.; Bajikar, S.S.; DeCarlo, F.; Kang, Y.W.; Kustom, R.L.; Mancini, D.C. et al.

Item Type: Article

Partner: UNT Libraries Government Documents Department

open access

Two- and three-dimensional ultrananocrystalline diamond (UNCD) structures for a high resolution diamond-based MEMS technology.

Silicon is currently the most commonly used material for the fabrication of microelectromechanical systems (MEMS). However, silicon-based MEMS will not be suitable for long-endurance devices involving components rotating at high speed, where friction and wear need to be minimized, components such as 2-D cantilevers that may be subjected to very large flexural displacements, where stiction is a problem, or components that will be exposed to corrosive environments. The mechanical, thermal, chemic… more

Date: January 17, 2000

Creator: Auciello, O.; Krauss, A. R.; Gruen, D. M.; Busmann, H. G.; Meyer, E. M.; Tucek, J. et al.

Item Type: Article

Partner: UNT Libraries Government Documents Department

open access

MM-wave cavity/klystron developments using deep x-ray lithography at the Advanced Photon Source.

Recent microfabrication technologies based on LIGA (German acronym for Li thographe, G alvanoformung, und A bformung) have been applied to build high-aspect-ratio, metallic or dielectric, planar structures suitable for high frequency rf cavity structures. The cavity structures would be used as parts of linear accelerators, microwave undulators, and mm-wave amplifiers. The microfabrication process includes manufacturing of precision x-ray masks, exposure of positive resist by x-rays through the … more

Date: March 31, 1998

Creator: Song, J.J.; Decarlo, F.; Kang, Y.W.; Kustom, R.L.; Mancini, D.c.; Nassiri, A. et al.

Item Type: Article

Partner: UNT Libraries Government Documents Department