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in creator/contributor: "Liang, Xiaogan"

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Understanding the mechanism of base development of hydrogen silsesquioxane

There have been numerous studies of electron beam exposed hydrogen silsesquioxane (HSQ) development conditions in order to improve the developer contrast. For TMAH based development, improvements were made by going to higher TMAH normalities and heating the developer. Yang and Berggren showed development of electron beam exposed (HSQ) by NaOH with added Na salts (various anions) significantly improves the contrast. Here, we study the contrast and etching rates of 100 keV exposed HSQ in NaOH in … more

Date: January 9, 2009

Creator: Kim, Jihoon; Chao, Weilun; Liang, Xiaogan; Griedel, Brian D. & Olynick, Deirdre L

Item Type: Article

Partner: UNT Libraries Government Documents Department

open access

Understanding the mechanism of base development of HSQ

We study the dissolution mechanism of HSQ (hydrogen silsesquioxane) in base solutions with the addition of chloride salts to elucidate the development mechanism. Reaction mechanisms are proposed based on the dissolution mechanism of quartz. Development kinetics points to two dose-dependent development mechanisms. Considering ion sizes, both hydrated and non-hydrated, and ion exchange, we propose that a combination of a surface dominated reaction at higher doses and a matrix dominated reaction a… more

Date: June 16, 2009

Creator: Kim, Jihoon; Chao, Weilun; Griedel, Brian; Liang, Xiaogan; Lewis, Mark; Hilken, Dawn et al.