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Recent progress in GaInAsSb thermophotovoltaics grown by organometallic vapor phase epitaxy

Description: Studies on the materials development of Ga{sub 1{minus}x}In{sub x}As{sub y}Sb{sub 1{minus}y} alloys for thermophotovoltaic (TPV) devices are reviewed. Ga{sub 1{minus}x}In{sub x}As{sub y}Sb{sub 1{minus}y} epilayers were grown lattice matched to GaSb substrates by organometallic vapor phase epitaxy (OMVPE) using all organometallic precursors including triethylgallium, trimethylindium, tertiarybutylarsine, and trimethylantimony with diethyltellurium and dimethylzinc as the n- and p-type dopants, respectively. The overall material quality of these alloys depends on growth temperature, In content, V/III ratio, substrate misorientation, and to a lesser extent, growth rate. A mirror-like surface morphology and room temperature photoluminescence (PL) are obtained for GaInAsSb layers with peak emission in the wavelength range between 2 and 2.5 {micro}m. The crystal quality improves for growth temperature decreasing from 575 to 525 C, and with decreasing In content, as based on epilayer surface morphology and low temperature PL spectra. A trend of smaller full width at half-maximum for low temperature PL spectra is observed as the growth rate is increased from 1.5 to 2.5 and 5 {micro}m/h. In general, GaInAsSb layers grown on (100) GaSb substrates with a 6{degree} toward (111)B misorientation exhibited overall better material quality than layers grown on the more standard substrate (100)2{degree} toward (110). Consistent growth of high performance lattice-matched GaInAsSb TPV devices is also demonstrated.
Date: June 1, 1998
Creator: Wang, C.A.; Choi, H.K.; Oakley, D.C. & Charache, G.W.
Partner: UNT Libraries Government Documents Department

Extending the cutoff wavelength of lattice-matched GaInAsSb/GaSb thermophotovoltaics devices

Description: This paper reports the growth, materials characterization, and device performance of lattice-matched GaInAsSb/GaSb thermophotovoltaic (TPV) devices with cutoff wavelength as long as 2.5 {micro}m. GaInAsSb epilayers were grown lattice matched to GaSb substrates by organometallic vapor phase epitaxy (OMVPE) using all organometallic precursors including triethylgallium, trimethylindium, tertiarybutylarsine, and trimethylantimony with diethyltellurium and dimethylzinc as the n- and p-type dopants, respectively. The growth temperature was 525 C. Although these alloys are metastable, a mirror-like surface morphology and room temperature photoluminescence (PL) are obtained for alloys with PL peak emission at room temperature as long as 2.5 {micro}m. In general, however, a trend of decreasing material quality is observed as the wavelength increases. Both the surface roughness and PL full width at half-maximum increase with wavelength. In spite of the dependence of material quality on PL peak emission wavelength, the internal quantum efficiency of TPV devices with cutoff wavelengths of 2.3 to 2.5 {micro}m is as high as 86%.
Date: October 1, 1998
Creator: Wang, C.A.; Choi, H.K.; Oakley, D.C. & Charache, G.W.
Partner: UNT Libraries Government Documents Department

Substrate misorientation effects on epitaxial GaInAsSb

Description: The effect of substrate misorientation on the growth of GaInAsSb was studied for epilayers grown lattice-matched to GaSb substrates by low-pressure organometallic vapor phase epitaxy. The substrates were (100) misoriented 2 or 6{degree} toward (110), (111)A, or (111)B. The surface is mirror-like and featureless for layers grown with a 6{degree} toward (111)B misorientation, while, a slight texture was observed for layers grown on all other misorientations. The optical quality of layers, as determined by the full width at half-maximum of photoluminescence spectra measured at 4K, is significantly better for layers grown on substrates with a 6{degree} toward (111)B misorientation. The incorporation of Zn as a p-type dopant in GaInAsSb is about 1.5 times more efficient on substrates with 6{degree} toward (111)B misorientation compared to 2{degree} toward (110) misorientation. The external quantum efficiency of thermophotovoltaic devices is not, however, significantly affected by substrate misorientation.
Date: December 1, 1997
Creator: Wang, C.A.; Choi, H.K.; Oakley, D.C. & Charache, G.W.
Partner: UNT Libraries Government Documents Department

Development of Simulation System for Hot Gas Filtration by Ceramic Candle Filters on High Temperature and/or High Pressure Conditions

Description: Hot gas filtration from industrial processes offers various advantages in terms of improvement of process efficiencies, heat recovery and protection of plant installation. Especially hot gas filtration is an essential technology for pressurized fluidized bed combustion (PFBC) and integrated gasification combined cycle (IGCC).
Date: September 19, 2002
Creator: Park, S.J.; Lim, J.H.; Kim, S.D.; Choi, H.K.; Park, H,S. & Park, Y.O.
Partner: UNT Libraries Government Documents Department

Lattice-matched epitaxial GaInAsSb/GaSb thermophotovoltaic devices

Description: The materials development of Ga{sub 1{minus}x}In{sub x}As{sub y}Sb{sub 1{minus}y} alloys for lattice-matched thermophotovoltaic (TPV) devices is reported. Epilayers with cutoff wavelength 2--2.4 {micro}m at room temperature and lattice-matched to GaSb substrates were grown by both low-pressure organometallic vapor phase epitaxy and molecular beam epitaxy. These layers exhibit high optical and structural quality. For demonstrating lattice-matched thermophotovoltaic devices, p- and n-type doping studies were performed. Several TPV device structures were investigated, with variations in the base/emitter thicknesses and the incorporation of a high bandgap GaSb or AlGaAsSb window layer. Significant improvement in the external quantum efficiency is observed for devices with an AlGaAsSb window layer compared to those without one.
Date: May 1, 1997
Creator: Wang, C.A.; Choi, H.K.; Turner, G.W.; Spears, D.L.; Manfra, M.J. & Charache, G.W.
Partner: UNT Libraries Government Documents Department

GaInAsSb materials for thermophotovoltaics

Description: Ga{sub 1{minus}x}In{sub x}As{sub 1{minus}y}Sb{sub y} (0.06 < x < 0.2, 0.05 < y < 0.18) epilayers were grown lattice-matched to GaSb substrates by organometallic vapor phase epitaxy (OMVPE) and molecular beam epitaxy (MBE). For lattice-matched alloys, mirror-like surface morphologies were obtained by both OMVPE and MBE. The 4K photoluminescence (PL) of all layers had a full-width at half-maximum (FWHM) of less than 10 meV for PL peak emission < 1.9 {micro}m. PL FWHM increased to 30 meV for peak emission {approximately}2.12 {micro}m for OMVPE-grown layers. Nominally undoped layers are p-type with typical 300 K hole concentration of {approximately}9 {times} 10{sup 15} cm{sup {minus}3} and hole mobility {approximately}450 to 580 cm{sup 2}/V-s for OMVPE-grown layers, p- and n-type doping is reported for layers grown with either technique. The ideality factor of diode structures is {approximately}2 for both techniques.
Date: December 1, 1996
Creator: Wang, C.A.; Turner, G.W.; Manfra, M.J.; Choi, H.K. & Spears, D.L.
Partner: UNT Libraries Government Documents Department

Limiting phase separation in epitaxial GaInAsSb

Description: GaInAsSb alloys are of great interest for lattice-matched thermophotovoltaic (TPV) devices because of the high performance attainable at 2.2 {micro}m. Extension of the TPV device cutoff wavelength to beyond 2.2 {micro}m is especially desirable since the emissive power of the source is significant at these longer wavelengths. However, the GaInAsSb quaternary alloy system exhibits a miscibility gap in the wavelength range of interest, and no devices with cutoff wavelengths longer than 2.3 {micro}m have been demonstrated. This paper reports the successful growth of GaInAsSb alloys which exhibit room temperature photoluminescence (PL) at wavelengths as long as 2.5 {micro}m. TPV devices with cutoff wavelengths out to 2.5 {micro}m exhibit external quantum efficiencies of 57%. These values are comparable to those measured for 2.2 {micro}m devices.
Date: November 1, 1998
Creator: Wang, C.A.; Ransom, S.L.; Oakley, D.C.; Choi, H.K. & Charache, G.W.
Partner: UNT Libraries Government Documents Department

Lattice-Matched GaInAsSb/A1GaAsSb/GaSb Materials for Thermophotovoltaic Devices

Description: High-performance GaInAsSb/AlGaAsSb/GaSb thermophotovoltaic (TPV) devices with quantum efficiency and fill factor near theoretical limits and open-circuit voltage within about 15% of the limit can be routinely fabricated. To achieve further improvements in TPV device performance, detailed materials studies of GaInAsSb epitaxial growth, the microstructure, and minority carrier lifetime, along with device structure considerations are reported. This paper discusses the materials and device issues, and their implications on TPV device performance. In addition, improvements in TPV performance with integrated distributed Bragg reflectors and back-surface reflectors are discussed.
Date: September 19, 2002
Creator: Wang, C.A.; Vineis, C.J.; Choi, H.K.; Connors, M.K.; Huang, R.H.; Daielson, L.R. et al.
Partner: UNT Libraries Government Documents Department