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Mutual passivation effects in Si-doped diluted In{sub y}Ga{sub 1-y}As{sub 1-x}N{sub x} alloys

Description: We report systematic investigations of the mutual passivation effects of Si hydrogenic donors and isovalent nitrogen in dilute InGaAs{sub 1-x}N{sub x} alloys. Upon thermal annealing at temperatures above {approx}650 C, the Si atoms diffuse assisted by the formation and migration of Ga vacancies. When they find nitrogen atoms, they form stable Si{sub Ga}-N{sub As} nearest-neighbor pairs. As a result of the pair formation, the electrical activity of Si{sub Ga} donors is passivated. At the same time, the effect of an equal number of N{sub As} atoms is also deactivated. The passivation of the shallow donors and the N{sub As} atoms is manifested in a drastic reduction in the free electron concentration and, simultaneously, an increase in the fundamental band gap. Analytical calculations of the passivation process based on Ga vacancies mediated diffusion show good agreement with the experimental results. Monte Carlo simulations have also been performed for a comparison with these results. The effects of mutual passivation on the mobility of free electrons are quantitatively explained on the basis of the band anticrossing model. Optical properties of annealed Si-doped InGaAs{sub 1-x}N{sub x} samples are also discussed.
Date: July 21, 2003
Creator: Wu, J.; Yu, K.M.; Walukiewicz, W.; He, G.; Haller, E.E.; Mars, D.E. et al.
Partner: UNT Libraries Government Documents Department

Effect of uniaxial stress on gallium, beryllium, and copper-doped germanium hole population inversion lasers

Description: The effects of stress on germanium lasers doped with single, double, and triple acceptors have been investigated. The results can be explained quantitatively with theoretical calculations and can be attributed to specific changes in the energy levels of acceptors in germanium under stress. In contrast to previous measurements, gallium-doped Ge crystals show a decrease in lasing upon uniaxial stress. The decrease seen here is attributed to the decrease in heavy hole effective mass upon application of uniaxial stress, which results in a decreased population inversion. The discrepancy between this work and previous studies can be explained with the low compensation level of the material used here. Because the amount of ionized impurity scattering in low-compensated germanium lasers is small to begin with, the reduction in scattering with uniaxial stress does not play a significant role in changing the laser operation. Beryllium-doped germanium lasers operate based on a different mechanism of population inversion. In this material it is proposed that holes can transfer between bands by giving their energy to a neutral beryllium atom, raising the hole from the ground to a bound excited state. The free hole will then return to zero energy with some probability of entering the other band. The minimum and maximum E/B ratios for lasing change with uniaxial stress because of the change in effective mass and bound excited state energy. These limits have been calculated for the case of 300 bar [100] stress, and match very well with the observed data. This adds further credence to the proposed mechanism for population inversion in this material. In contrast to Be and Ga-doped lasers, copper-doped lasers under uniaxial stress show an increase in the range of E and B where lasing is seen. To understand this change the theoretical limits for population inversion based on both the ...
Date: May 1998
Creator: Chamberlin, D. R.
Partner: UNT Libraries Government Documents Department

Mutual passivation of group IV donors and isovalent nitrogen in diluted GaN{sub x}As{sub 1-x} alloys

Description: We demonstrate the mutual passivation of electrically active group IV donors and isovalent N atoms in the GaN{sub x}As{sub 1-x} alloy system. This phenomenon occurs through the formation of a donor-nitrogen bond in the nearest neighbor IV{sub Ga}-N{sub As} pairs. In Si doped GaInN{sub 0.017}As{sub 0.983} the electron concentration starts to decrease rapidly at an annealing temperature of 700 C from {approx} 3 x 10{sup 19}cm{sup -3} in the as-grown state to less than 10{sup 16}cm{sup -3} after an annealing at 900 C for 10 s. At the same time annealing of this sample at 950 C increases the gap by about 35 meV, corresponding to a reduction of the concentration of the active N atoms by an amount very close to the total Si concentration. We also show that the formation of Si{sub Ga}-N{sub As} pairs is controlled by the diffusion of Si via Ga vacancies to the nearest N{sub As} site. The general nature of this mutual passivation effect is confirmed by our study of Ge doped GaN{sub x}As{sub 1-x} layers formed by N and Ge co-implantation in GaAs followed by pulsed laser melting.
Date: July 23, 2003
Creator: Yu, K.M.; Wu, J.; Walukiewicz, W.; Shan, W.; Beeman, J.; Mars, D.E. et al.
Partner: UNT Libraries Government Documents Department

Nitrogen-Induced Modification of the Electronic Structure of Group III-N-V Alloys: Preprint

Description: Incorporation of nitrogen in conventional III-V compound semiconductors to form III-N-V alloys leads to a splitting of the conduction band into two nonparabolic sub-bands. The splitting can be described in terms of an anticrossing interaction between a narrow band of localized nitrogen states and the extended conduction-band states of the semiconductor matrix. The downward shift of the lower sub-band edge is responsible for the N-induced reduction of the fundamental band-gap energy. The modification of the conduction-band structure profoundly affects the optical and electrical properties of the III-N-V alloys.
Date: April 1, 1999
Creator: Walukiewicz, W.; Shan, W.; Ager III, J. W.; Chamberlin, D. R.; Haller, E. E. (Lawrence Berkeley National Laboratory); Geisz, J. F. et al.
Partner: UNT Libraries Government Documents Department