Description: The IMPACT (Interaction of Materials with charged Particles And Components Testing) experiment at Argonne National Laboratory was used to expose Pd, Ru, and Re-capped Ru candidate EUV light collector mirror materials to conditions similar to extreme-ultraviolet (EUV) lithography source devices, in particular high-energy singly-charged Xe ions. Experiments measured both the time-dependent atomic surface concentration evolution of candidate single-layer mirror (SLM) samples and the Xe+-induced sputtering yield. Elemental surface information was acquired using low-energy ion scattering spectroscopy (LEISS) and sputtering yields were acquired using an in-situ quartz crystal microbalance. Sputtering results show large erosion rates between 0.5 and up to 7.0 for Pd and Ru SLM samples for energies between 500 and 1000 eV of Xe+ irradiation at grazing incidence. Re-capped Ru SLM samples also demonstrated very high sputter yields. Time-dependent erosion rate measurements used with LEISS resulted in a high depth-resolution profile and led to the discovery of ion-induced recoil implantation of oxygen atoms to the Ru mirror surface. High concentration of oxygen throughout the Ru SLM may be detrimental to the reflectivity response of the collector mirror.
Date: January 1, 2005
Creator: Rokusek, D.L.; Allain, J.P.; Hassanein, A. & Nieto, M.
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Partner: UNT Libraries Government Documents Department