High-precision reflectometry of multilayer coatings for extreme ultraviolet lithography
Description:
Synchrotron-based reflectometry is an important technique for the precise determination of optical properties of reflective multilayer coatings for Extreme Ultraviolet Lithography (EUVL). Multilayer coatings enable normal incidence reflectances of more than 65% in the wavelength range between 11 and 15 nm. In order to achieve high resolution and throughput of EUVL systems, stringent requirements not only apply to their mechanical and optical layout, but also apply to the optical properties of t…
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Date:
December 29, 1999
Creator:
Wedowski, M; Underwood, J H; Gullikson, E M; Bajt, S; Folta, J A; Kearney, P A et al.
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Partner:
UNT Libraries Government Documents Department