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Thermal annealing behavior of an oxide layer under silicon

Description: This article discusses the thermal annealing behavior of an oxide layer under silicon.
Date: December 15, 1982
Creator: Hamdi, A. H.; McDaniel, Floyd Del. (Floyd Delbert), 1942-; Pinizzotto, Russell F.; Matteson, Samuel E.; Lam, H. W. & Malhi, S. D. S.
Item Type: Article
Partner: UNT College of Arts and Sciences