Fast diffusion of As in polycrystalline silicon during rapid thermal annealing
Description:
This article discusses fast diffusion of As in polycrystalline silicon during rapid thermal annealing.
Date:
May 30, 1984
Creator:
Wilson, Scott R.; Paulson, W. M.; Gregory, R. B.; Gressett, J. D.; Hamdi, A. H. & McDaniel, Floyd Del. (Floyd Delbert), 1942-
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UNT College of Arts and Sciences